Fringing Effects in a Capacitive Micromachined Ultrasonic Transducer with a SiC Actuation Layer Insulated by High Dielectric Material

Sealed capacitive micromachined ultrasonic transducer (CMUT) mostly consists of two parallel electrodes separated by a structural layer of silicon nitride (Si<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf>N<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</inf>) and a vacuum cavity. Biasing the transducer element generates electrostatic force of attraction where the lines in the field bulge at the boundaries of the layers contributing to fringing effects. These fringing capacitances result in overall increment of the device capacitance. To capture this effect a very simple model of Landau and Lifschitz is incorporated, where the analytical model outputs are well matched with commercially available PZFlex FEM simulated results. Because silicon carbide (SiC) has a higher Young's modulus and lower residual stress than Si3N4, it is used as a structural material in the CMUT. The improvement in device capacitance is approximately 13.1% through adjustments in the thickness of gaps and insulation. However, factoring in the relative dielectric constant and the electrode radius, this improvement reduces to around 7.9%. Additionally, introducing a high-k insulating layer enables the upper electrode to be structured on the lower face of the SiC layer. This modification leads to an augmentation in the device's total capacitance. This article also examines HfO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> materials of varied thicknesses.

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Published
2024-11-30
DOI
https://doi.org/10.1109/edkcon62339.2024.10870794
Citations
1
Primary Topic
Advanced MEMS and NEMS Technologies
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article
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0.21
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article

Fringing Effects in a Capacitive Micromachined Ultrasonic Transducer with a SiC Actuation Layer Insulated by High Dielectric Material

Biswarup Neogi, Moumita Pal, Pritam Chakraborty, Sk. Sohel Ahamed et al.
1 citations
Advanced MEMS and NEMS Technologies
0.21
article

Fringing Effects in a Capacitive Micromachined Ultrasonic Transducer with a SiC Actuation Layer Insulated by High Dielectric Material

Biswarup Neogi, Moumita Pal, Pritam Chakraborty, Sk. Sohel Ahamed, N. P. Maity, R. Das
article en
1 citations

Abstract

Sealed capacitive micromachined ultrasonic transducer (CMUT) mostly consists of two parallel electrodes separated by a structural layer of silicon nitride (Si<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf>N<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</inf>) and a vacuum cavity. Biasing the transducer element generates electrostatic force of attraction where the lines in the field bulge at the boundaries of the layers contributing to fringing effects. These fringing capacitances result in overall increment of the device capacitance. To capture this effect a very simple model of Landau and Lifschitz is incorporated, where the analytical model outputs are well matched with commercially available PZFlex FEM simulated results. Because silicon carbide (SiC) has a higher Young's modulus and lower residual stress than Si3N4, it is used as a structural material in the CMUT. The improvement in device capacitance is approximately 13.1% through adjustments in the thickness of gaps and insulation. However, factoring in the relative dielectric constant and the electrode radius, this improvement reduces to around 7.9%. Additionally, introducing a high-k insulating layer enables the upper electrode to be structured on the lower face of the SiC layer. This modification leads to an augmentation in the device's total capacitance. This article also examines HfO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> materials of varied thicknesses.

University of Engineering & Management (IN), Mizoram University (IN), National Institute of Technical Teachers’ Training and Research (IN), University of Kalyani (IN)
Openalex Percentile: Top 44%
Advanced MEMS and NEMS Technologies
0.21
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