Doping Dependent Electron Transport Mobility in Al<sub>0.3</sub>Ga<sub>0.7</sub>As/In<sub>0.15</sub>Ga<sub>0.85</sub>As Double Quantum Well Field Effect Transistor Structure
The doping dependence electron transport mobility <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mu^{t}$</tex> due to different clastic scatterings in Al<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.3</inf>Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.7</inf>As / In<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.15</inf>Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.85</inf>As double quantum well field effect transistor structure is reported. In the absence of an electric field i.e., <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$F = 0$</tex>, two sub bands are occupied. As doping concentration <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(N_{d})$</tex> increases from 0.5 to <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$1.5\times 10^{18}\text{cm}^{-3}.\mu^{t}$</tex> enhances from 3.2 to <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$4.5\times 10^{4}\text{cm}^{2}/\text{Vs}$</tex>. As <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\vert F\vert$</tex> increases, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mu^{t}$</tex> enhances and shows the transition of subband states from two to one at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\vert F\vert =5$</tex> to 13.2 kV/cm for <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$N_{d}=0.5$</tex> to <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$1.5\times 10^{18} \text{cm}^{-3}$</tex> respectively. Here, the variation of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mu^{t}$</tex> with <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$F$</tex> is decided by the symmetric nature of ionized impurity scattering. Still the asymmetric scattering potential of interface roughness reduces <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mu^{t}$</tex> more for positive <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$F$</tex>.
Authors
- Ram Chandra Swain
- N. K. Sahoo (ORCID: https://orcid.org/0000-0002-8254-6140)
- Ajit Kumar Sahu (ORCID: https://orcid.org/0000-0002-8376-6575)
Institutions
- Berhampur University (IN)
Publication Details
- Published
- 2024-11-30
- DOI
- https://doi.org/10.1109/edkcon62339.2024.10870622
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00