Investigation of Analog and Digital Performance for Gallium-Arsenide GS GAA FETs

This paper investigates the effectiveness of GaAs as a fin material for both analog and digital applications in GaAs Gate-Stack Gate-All-Around FinFET with spacers. Various analog and digital parameters such as drain current, Ion, Ioff, switching speed, SS (subthreshold swing), gm (transconductance), output conductance, transconductance generation factor (TGF), intrinsic gain (Av), early voltage, Cgg and Cut-off Frequency have been examined. The simulated results indicate that incorporating GS and high-k gate spacers significantly enhanced the device's DC and AC performance metrics.

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Published
2024-11-30
DOI
https://doi.org/10.1109/edkcon62339.2024.10870667
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
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article

Investigation of Analog and Digital Performance for Gallium-Arsenide GS GAA FETs

Sneha Singh, Rudra Sankar Dhar, Srikanta Bose, Abhishek Kumar
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Advancements in Semiconductor Devices and Circuit Design
article

Investigation of Analog and Digital Performance for Gallium-Arsenide GS GAA FETs

Sneha Singh, Rudra Sankar Dhar, Srikanta Bose, Abhishek Kumar
article en

Abstract

This paper investigates the effectiveness of GaAs as a fin material for both analog and digital applications in GaAs Gate-Stack Gate-All-Around FinFET with spacers. Various analog and digital parameters such as drain current, Ion, Ioff, switching speed, SS (subthreshold swing), gm (transconductance), output conductance, transconductance generation factor (TGF), intrinsic gain (Av), early voltage, Cgg and Cut-off Frequency have been examined. The simulated results indicate that incorporating GS and high-k gate spacers significantly enhanced the device's DC and AC performance metrics.

Maulana Azad National Institute of Technology (IN)
Openalex Percentile: Top 75%
Advancements in Semiconductor Devices and Circuit Design
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