64% AlGaN Channel HFET With High Johnson’s Figure of Merit (>6 THz·V)

In this letter, we report a heterostructure field effect transistor (HFET) with Al0.87Ga0.13N barrier and Al0.64Ga0.36N channel grown by metalorganic chemical vapor deposition (MOCVD). TLM measurements of the structure showed a sheet resistance of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\sim ~2000~\Omega $ </tex-math></inline-formula>/sq and linear ohmic contact resistance of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4.54~\Omega \cdot $ </tex-math></inline-formula> mm. A HFET with a gate length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\sim ~200$ </tex-math></inline-formula> nm, source-drain spacing of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4~\mu $ </tex-math></inline-formula>m showed a peak transconductance of ~40 mS/mm and a high peak drain current of ~0.6 A/mm. A current gain cutoff frequency (f<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {T}}\text {)}$ </tex-math></inline-formula> of 15.7 GHz and a power gain cutoff frequency of 20.4 GHz was observed. The breakdown voltage of this device is 390 V, yielding a high Johnson’s figure of merit (JFOM) of 6.1 THz<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\cdot $ </tex-math></inline-formula> V. This JFOM value is one of the highest reported JFOM values for AlxGa<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {1-{x}}}$ </tex-math></inline-formula>N channel HFET (x >0.4) and also for other ultra-wide bandgap (UWBG) transistors.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-02-13
DOI
https://doi.org/10.1109/led.2025.3541145
Citations
12
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
15.10

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article

64% AlGaN Channel HFET With High Johnson’s Figure of Merit (>6 THz·V)

Parthasarathy Seshadri, Chirag Gupta, Kenneth Stephenson, Ruixin Bai et al.
12 citations
IEEE Electron Device Letters
GaN-based semiconductor devices and materials
15.10
article

64% AlGaN Channel HFET With High Johnson’s Figure of Merit (>6 THz·V)

Parthasarathy Seshadri, Chirag Gupta, Kenneth Stephenson, Ruixin Bai, Asif Khan, Jiahao Chen, Zehuan Wang, Md Abdullah Mamun
article en
12 citations

Abstract

In this letter, we report a heterostructure field effect transistor (HFET) with Al0.87Ga0.13N barrier and Al0.64Ga0.36N channel grown by metalorganic chemical vapor deposition (MOCVD). TLM measurements of the structure showed a sheet resistance of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\sim ~2000~\Omega $ </tex-math></inline-formula>/sq and linear ohmic contact resistance of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4.54~\Omega \cdot $ </tex-math></inline-formula> mm. A HFET with a gate length of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\sim ~200$ </tex-math></inline-formula> nm, source-drain spacing of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$4~\mu $ </tex-math></inline-formula>m showed a peak transconductance of ~40 mS/mm and a high peak drain current of ~0.6 A/mm. A current gain cutoff frequency (f<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {T}}\text {)}$ </tex-math></inline-formula> of 15.7 GHz and a power gain cutoff frequency of 20.4 GHz was observed. The breakdown voltage of this device is 390 V, yielding a high Johnson’s figure of merit (JFOM) of 6.1 THz<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\cdot $ </tex-math></inline-formula> V. This JFOM value is one of the highest reported JFOM values for AlxGa<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {1-{x}}}$ </tex-math></inline-formula>N channel HFET (x >0.4) and also for other ultra-wide bandgap (UWBG) transistors.

IEEE Electron Device LettersVol. 46(4)
University of Wisconsin–Madison (US), University of South Carolina (US)
Division of Electrical, Communications and Cyber Systems, Air Force Office of Scientific Research
Openalex Percentile: Top 1%
GaN-based semiconductor devices and materials
15.10
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