Characterization and reduction of RF loss up to 110 GHz by optimizing the UID-GaN layer in N-polar GaN material

In this work, the mechanism of RF loss up to 110 GHz for N-polar GaN has been studied. With the assistance of S-parameter characterization combined with secondary ion mass spectroscopy analyses, the incorporated oxygen impurity has been identified to be the main source bringing about the severe RF loss of N-polar GaN. The compensation of Fe-doping enables an effective reduction in RF loss. Moreover, the unintentionally doped (UID) GaN layer grown on top of the Fe-doped GaN buffer requires a careful design due to the distinct memory effect of Fe-doping in N-polar GaN. With an optimization of its thickness, a very low RF loss of 0.36 dB/mm at 94 GHz has been attained. Furthermore, by fitting the Fe concentration profile of UID-GaN according to the mass balance rate equation, it is found that the desorption of Fe on the N-polar GaN surface is significant. A bond-based model is introduced to elucidate the difference of the Fe memory effect between Ga-polar and N-polar GaN.

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Publication Details

Journal
Applied Physics Letters
Published
2025-02-10
DOI
https://doi.org/10.1063/5.0256418
Citations
4
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
5.03

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article

Characterization and reduction of RF loss up to 110 GHz by optimizing the UID-GaN layer in N-polar GaN material

Sheng Cheng, Xiaoning Zhan, Yu Zhou, Qingru Wang et al.
4 citations
Applied Physics Letters
GaN-based semiconductor devices and materials
5.03
article

Characterization and reduction of RF loss up to 110 GHz by optimizing the UID-GaN layer in N-polar GaN material

Sheng Cheng, Xiaoning Zhan, Yu Zhou, Qingru Wang, X.Y. Zhang, Qian Sun, Qian Li, Jianxun Liu, Yu Qi, Hui Yang
article en
4 citations

Abstract

In this work, the mechanism of RF loss up to 110 GHz for N-polar GaN has been studied. With the assistance of S-parameter characterization combined with secondary ion mass spectroscopy analyses, the incorporated oxygen impurity has been identified to be the main source bringing about the severe RF loss of N-polar GaN. The compensation of Fe-doping enables an effective reduction in RF loss. Moreover, the unintentionally doped (UID) GaN layer grown on top of the Fe-doped GaN buffer requires a careful design due to the distinct memory effect of Fe-doping in N-polar GaN. With an optimization of its thickness, a very low RF loss of 0.36 dB/mm at 94 GHz has been attained. Furthermore, by fitting the Fe concentration profile of UID-GaN according to the mass balance rate equation, it is found that the desorption of Fe on the N-polar GaN surface is significant. A bond-based model is introduced to elucidate the difference of the Fe memory effect between Ga-polar and N-polar GaN.

Applied Physics LettersVol. 126(6)
University of Science and Technology of China (CN), Chinese Academy of Sciences (CN), Suzhou Institute of Nano-tech and Nano-bionics (CN)
National Natural Science Foundation of China, Natural Science Foundation of Jiangsu Province, Youth Innovation Promotion Association of the Chinese Academy of Sciences, Bureau of International Cooperation, Chinese Academy of Sciences, Jiangsu Provincial Key Research and Development Program, National Key Research and Development Program of China, Science and Technology Program of Suzhou, Basic and Applied Basic Research Foundation of Guangdong Province
Openalex Percentile: Top 6%
GaN-based semiconductor devices and materials
5.03
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