Chromatic confocal microscopy for quasi-crystal morphology scanning
As semiconductor technology advances, chips are becoming increasingly smaller, leading to a growing demand for higher yield rates. As a result, defect detection has become a critical area of research. Currently, defect detection is primarily performed through Automated Optical Inspection (AOI) utilizing machine vision. However, many defects are associated with material composition, making them difficult to identify using AOI alone. To address this challenge, integrating hyperspectral technology into AOI presents a promising solution. In this paper, we explore the use of hyperspectral technology to measure the surface morphology of quasi-crystal patterns printed on UV resin. By employing different wavelengths for the measurements, we observed that the quasi-crystal patterns exhibit distinct appearances under varying wavelengths. The results from both short and long wavelengths reveal significant structural differences.
Authors
- Yung‐Fu Chen (ORCID: https://orcid.org/0000-0003-2327-4330)
- Chun-Jen Weng (ORCID: https://orcid.org/0000-0003-1489-5194)
- Guo-Hao Lu
- Songqing Lin
- H. C. Liang
Institutions
- National Yang Ming Chiao Tung University (TW)
- National Institutes of Applied Research (TW)
Publication Details
- Published
- 2024-12-10
- DOI
- https://doi.org/10.1109/ispacs62486.2024.10868282
- Primary Topic
- Image Processing Techniques and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Science and Technology Council