Fabrication of n-type and p-type WSe<sub>2</sub> field-effect transistors and their low-voltage CMOS inverter operation

Abstract This paper describes the concepts for achieving n-type and p-type WSe 2 field-effect transistors (FETs) and their complementary metal-oxide-semiconductor (CMOS) inverter operation. First, n-type and p-type WSe 2 FETs were demonstrated using molecular chemistry approaches that offer the manipulation of WSe 2 properties through low-temperature, low-energy processes. Next, the advancement in device technology was explained to achieve symmetric characteristics in n-type and p-type WSe 2 FETs. WSe 2 single-channel CMOS offers a promising pathway for simplifying device integration to suppress variability and fluctuations in FET characteristics, although many challenges remain to be addressed. Further fundamental research holds the potential to advance the development of WSe 2 single-channel CMOS devices.

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Publication Details

Journal
Japanese Journal of Applied Physics
Published
2025-02-01
DOI
https://doi.org/10.35848/1347-4065/adb43a
Citations
2
Primary Topic
Chalcogenide Semiconductor Thin Films
Type
article
Field-Weighted Citation Impact
1.46
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article

Fabrication of n-type and p-type WSe2 field-effect transistors and their low-voltage CMOS inverter operation

Takuya Hoshii, Kuniyuki Kakushima, Iriya Muneta, Hitoshi Wakabayashi et al.
2 citations
Japanese Journal of Applied Physics
Chalcogenide Semiconductor Thin Films
1.46
article

Fabrication of n-type and p-type WSe2 field-effect transistors and their low-voltage CMOS inverter operation

Takuya Hoshii, Kuniyuki Kakushima, Iriya Muneta, Hitoshi Wakabayashi, Takamasa Kawanago, Kazuo Tsutsui
article en
2 citations

Abstract

Abstract This paper describes the concepts for achieving n-type and p-type WSe 2 field-effect transistors (FETs) and their complementary metal-oxide-semiconductor (CMOS) inverter operation. First, n-type and p-type WSe 2 FETs were demonstrated using molecular chemistry approaches that offer the manipulation of WSe 2 properties through low-temperature, low-energy processes. Next, the advancement in device technology was explained to achieve symmetric characteristics in n-type and p-type WSe 2 FETs. WSe 2 single-channel CMOS offers a promising pathway for simplifying device integration to suppress variability and fluctuations in FET characteristics, although many challenges remain to be addressed. Further fundamental research holds the potential to advance the development of WSe 2 single-channel CMOS devices.

Japanese Journal of Applied PhysicsVol. 64(2)
Tokyo Institute of Technology (JP), Japan Science and Technology Agency (JP), National Institute of Advanced Industrial Science and Technology (JP)
Openalex Percentile: Top 19%
Chalcogenide Semiconductor Thin Films
1.46
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