CVD: A versatile deposition method for tuning composition and morphology of functional oxide thin films

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SPIRE - Sciences Po Institutional REpository
Published
2024-11-07
Primary Topic
Semiconductor materials and devices
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article
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article

CVD: A versatile deposition method for tuning composition and morphology of functional oxide thin films

Carmen Jiménez
SPIRE - Sciences Po Institutional REpository
Semiconductor materials and devices
article

CVD: A versatile deposition method for tuning composition and morphology of functional oxide thin films

Carmen Jiménez
article en

Abstract

No abstract available for this paper.
SPIRE - Sciences Po Institutional REpository
Institut polytechnique de Grenoble (FR), Laboratoire des Matériaux et du Génie Physique (FR)
Openalex Percentile: Top 75%
Semiconductor materials and devices
OpenAlex
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CVD: A versatile deposition method for tuning composition and morphology of functional oxide thin films — Carmen Jiménez · SPIRE - Sciences Po Institutional REpository (2024) | TGRS Research Map | TGRS