Suppression of Drain-Bias-Induced <i>V</i>TH Instability in Schottky-Type <i>p</i>-GaN Gate HEMTs With Voltage Seatbelt
A cost-effective yet efficient approach is proposed for suppressing the drain-bias-induced threshold voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {TH}}$ </tex-math></inline-formula>) instability in Schottky-type p-gallium nitride (GaN) gate high electron mobility transistors (HEMTs). The proposed device consists of a source-connected metal layer on a dielectric layer in the gate-to-drain access region, which operates as a voltage seatbelt that restricts the voltage coupling to the p-GaN region from the drain within a defined range. By adjusting the dielectric thickness in the proposed structure, the voltage potential experienced by the p-GaN region is confined within a range of 3.1–22.3 V at a drain voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {DS}}$ </tex-math></inline-formula>) of 400 V. In the scenario with a 3.1-V clamping voltage, the proposed configuration demonstrates a remarkable reduction of over 95% in <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {TH}}$ </tex-math></inline-formula> shift caused by the floating nature of p-GaN, along with a reduction of 88% in <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {TH}}$ </tex-math></inline-formula> shift induced by trapping effects. The proposed structure also enhances short-circuit robustness by reducing the saturation current density, while exerting only a minimal effect on the devices’ on-resistance (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R} _{\text {ON}}$ </tex-math></inline-formula>). The proposed structure offers room for balancing the tradeoff between the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R} _{\text {ON}}$ </tex-math></inline-formula> and the short-circuit robustness in practical applications.
Authors
- Jinjin Tang (ORCID: https://orcid.org/0000-0003-3927-0350)
- Mengyuan Hua (ORCID: https://orcid.org/0000-0003-3016-1588)
- Guosong Zeng (ORCID: https://orcid.org/0000-0002-5626-8300)
- Junting Chen (ORCID: https://orcid.org/0000-0003-2505-2758)
- Yan Cheng (ORCID: https://orcid.org/0000-0003-1433-7862)
- Kevin J. Chen (ORCID: https://orcid.org/0000-0002-0659-2022)
- Junqiang Li (ORCID: https://orcid.org/0000-0002-2822-7325)
- Jiongchong Fang
- Haohao Chen
- Zheng Wu
Institutions
- Hong Kong University of Science and Technology (HK)
- Southern University of Science and Technology (CN)
Publication Details
- Journal
- IEEE Transactions on Electron Devices
- Published
- 2025-02-10
- DOI
- https://doi.org/10.1109/ted.2025.3534168
- Citations
- 5
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 6.29
Funders
- National Natural Science Foundation of China
- Shenzhen Fundamental Research Program
- Basic and Applied Basic Research Foundation of Guangdong Province