General Quality Characteristic Design of Low Field Quantum Resistance Standard
New low field quantum resistance standard solves troublesome issues of traditional quantum resistance standard, and meets the wide demand for high accuracy measurement of precision resistance in China, marks the development trend of quantum resistance. The new low field quantum resistance standard perfectly combines functional performance index and general quality characteristic index. General quality characteristic work implements the whole process of the product design, ensures the overall quality at the stage of product development and lays the foundation for subsequent production and commercialization.
Authors
- Qian Zhao (ORCID: https://orcid.org/0000-0002-9540-5726)
- Yujun Xu (ORCID: https://orcid.org/0000-0002-8487-7584)
- Zhen Jiang
- Yinghui Guo (ORCID: https://orcid.org/0000-0003-4143-1600)
- Kun Cao (ORCID: https://orcid.org/0000-0001-6412-1897)
- Jiangqi Zhu (ORCID: https://orcid.org/0009-0009-5322-6090)
Publication Details
- Published
- 2024-11-29
- DOI
- https://doi.org/10.1109/icmsp64464.2024.10866440
- Primary Topic
- Integrated Circuits and Semiconductor Failure Analysis
- Type
- article
- Field-Weighted Citation Impact
- 0.00