Charge Balance Design of 1200-V E-Mode p-GaN Gate HEMT Toward Enhanced Breakdown Voltage and Dynamic Stability
This work investigates the charge balance design of the 1200-V E-mode lateral superjunction p-GaN gate HEMT (SJ-HEMT) on sapphire substrate. The charge balance is formed through the alternative p-/n-pillars; the p-pillars are thinned p-GaN stripes, and the n-pillars are 2DEG stripes. The charge balance design on the static and dynamic performance of the SJ-HEMT was investigated by tuning the width of p-/n-pillars. The SJ-HEMT with charge balance yields a BV of 2655 V and a high BV/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${L}_{\text {GD}}$ </tex-math></inline-formula> ratio of 1.56 MV/cm. Notably, the SJ-HEMT demonstrates effective suppression of trapping effects, which exhibits a strong correlation with the gap between two p-pillars. At charge balance design, the SJ-HEMT presents an excellent dynamic <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {ON}}$ </tex-math></inline-formula>/static <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {ON}}$ </tex-math></inline-formula> ratio of 1.28 under <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}}$ </tex-math></inline-formula> stress up to 1200 V. Our study also indicates a scaling of p-/n-pillars can further improve the dynamic <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {ON}}$ </tex-math></inline-formula> performance. This work underscores the merits of charge-balanced design for high-performance 1200-V E-mode GaN power transistors.
Authors
- Teng Li (ORCID: https://orcid.org/0009-0000-8259-134X)
- Jingjing Yu (ORCID: https://orcid.org/0000-0002-0301-3312)
- Xiaosen Liu (ORCID: https://orcid.org/0000-0003-2767-215X)
- Jiawei Cui (ORCID: https://orcid.org/0000-0001-6000-1505)
- Maojun Wang (ORCID: https://orcid.org/0000-0002-9078-6961)
- Junjie Yang (ORCID: https://orcid.org/0000-0003-3614-7306)
- Jinyan Wang (ORCID: https://orcid.org/0000-0001-9385-9903)
- Jin Wei (ORCID: https://orcid.org/0000-0001-6124-0110)
- Hao Chang (ORCID: https://orcid.org/0009-0000-0870-5193)
- Sihang Liu (ORCID: https://orcid.org/0000-0001-8844-6792)
- Bo Shen (ORCID: https://orcid.org/0000-0003-2786-8400)
- Yunhong Lao (ORCID: https://orcid.org/0009-0003-0537-7931)
Institutions
- Peking University (CN)
- Tsinghua University (CN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2025-02-06
- DOI
- https://doi.org/10.1109/led.2025.3539353
- Citations
- 4
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 5.03