Atomistic Understanding of Dislocation Climb in Nitride Semiconductors: Role of Asymmetric Jogs

Effective control of dislocation climb is of fundamental interest and practical importance in tuning the mechanical and electronic properties of semiconductors. However, it remains a big challenge due to the lack of a clear understanding of its inherent mechanism, in particular, in the nitride semiconductors. In this Letter, the atomic-scale climb process of a single dislocation in GaN is observed for the first time, which undergoes an alternating five- and nine-atomic-ring transformation. Combined with first-principles calculations, we reveal that the jogs exhibiting asymmetric atomic configurations play an unexpected role in determining the different dislocation climb behaviors in GaN. Interestingly, tuning the Fermi-level position by electroactive dopants can selectively generate different species of jogs, which can consequently manipulate the dislocation climb behaviors and dislocation dissociation in a controllable way. Our findings not only highlight the significant role the asymmetric jogs play in the dislocation climb in nitrides, but also suggest a clear routine to control dislocation dynamics in semiconductors.

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Publication Details

Journal
Physical Review Letters
Published
2025-02-05
DOI
https://doi.org/10.1103/physrevlett.134.056102
Citations
5
Primary Topic
Metal and Thin Film Mechanics
Type
article
Field-Weighted Citation Impact
4.32

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article

Atomistic Understanding of Dislocation Climb in Nitride Semiconductors: Role of Asymmetric Jogs

Ning Tang, Xinqiang Wang, Xuelin Yang, Zhenghao Chen et al.
5 citations
Physical Review Letters
Metal and Thin Film Mechanics
4.32
article

Atomistic Understanding of Dislocation Climb in Nitride Semiconductors: Role of Asymmetric Jogs

Ning Tang, Xinqiang Wang, Xuelin Yang, Zhenghao Chen, Bing Qiang Huang, Guangxu Ju, Tongjun Yu, Fujun Xu, Han Yang, Bin Chen, Yingming Song, Xiangru Han, Bo Shen, Weikun Ge
article en
5 citations

Abstract

Effective control of dislocation climb is of fundamental interest and practical importance in tuning the mechanical and electronic properties of semiconductors. However, it remains a big challenge due to the lack of a clear understanding of its inherent mechanism, in particular, in the nitride semiconductors. In this Letter, the atomic-scale climb process of a single dislocation in GaN is observed for the first time, which undergoes an alternating five- and nine-atomic-ring transformation. Combined with first-principles calculations, we reveal that the jogs exhibiting asymmetric atomic configurations play an unexpected role in determining the different dislocation climb behaviors in GaN. Interestingly, tuning the Fermi-level position by electroactive dopants can selectively generate different species of jogs, which can consequently manipulate the dislocation climb behaviors and dislocation dissociation in a controllable way. Our findings not only highlight the significant role the asymmetric jogs play in the dislocation climb in nitrides, but also suggest a clear routine to control dislocation dynamics in semiconductors.

Physical Review LettersVol. 134(5)
King University (US), Peking University (CN), Beijing Normal University (CN), Collaborative Innovation Center of Quantum Matter (CN), Beijing Computational Science Research Center (CN), State Key Laboratory of Artificial Microstructure and Mesoscopic Physics
National Natural Science Foundation of China, Peking University, National Key Research and Development Program of China, National Safety Academic Fund
Openalex Percentile: Top 7%
Metal and Thin Film Mechanics
4.32
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