Stress modulation of hafnium-based ferroelectric material orientation in 3D cylindrical capacitor

Hafnium-based ferroelectric materials have attracted a lot of attention, but the distributions of the materials need to be tuned for commercialization, including phase distribution and polarization orientation distribution. The orientation of ferroelectric materials plays a significant role in memory device performance; however, there have been no reliable methods to control this orientation until now. This paper investigates the control of ferroelectric phase polarization orientation in 3D cylindrical capacitors. This optimization is made possible because the 3D cylindrical capacitor allows stress application in the tangential, axial, and radial directions, offering a wider range of adjustment options than 2D planar structures. The study focuses on how stress distribution affects ferroelectric phase orientation in hafnium-based materials when the diameters of cylindrical capacitors are varied. First, stress simulations are conducted to analyze the stress distribution in cylindrical capacitors with different diameters. The results indicate that the hafnium oxide layer experiences increased radical stress as the capacitor diameter decreases. Subsequently, capacitors with two different diameters are fabricated, significantly improving the polarization orientation in the thinner one. It is found that the capacitor diameter and the polarization orientation are strongly related through the correlation analysis. Finally, we demonstrate the improvement in the polarization orientation of ferroelectric thin films by radical stress through first-principles calculations. This study provides valuable insights into how stress distribution influences polarization orientation in hafnium-based ferroelectric films and is crucial for advancing the use of ferroelectric materials in future technologies.

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Publication Details

Journal
AIP Advances
Published
2025-02-01
DOI
https://doi.org/10.1063/5.0230610
Citations
2
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
1.46

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article

Stress modulation of hafnium-based ferroelectric material orientation in 3D cylindrical capacitor

Yuancheng Yang, Zongliang Huo, Bao Zhang, Wenqi Li et al.
2 citations
AIP Advances
Ferroelectric and Negative Capacitance Devices
1.46
article

Stress modulation of hafnium-based ferroelectric material orientation in 3D cylindrical capacitor

Yuancheng Yang, Zongliang Huo, Bao Zhang, Wenqi Li, Meiying Liu, Yong Feng Cheng, Zhiliang Xia, Lei Liu
article en
2 citations

Abstract

Hafnium-based ferroelectric materials have attracted a lot of attention, but the distributions of the materials need to be tuned for commercialization, including phase distribution and polarization orientation distribution. The orientation of ferroelectric materials plays a significant role in memory device performance; however, there have been no reliable methods to control this orientation until now. This paper investigates the control of ferroelectric phase polarization orientation in 3D cylindrical capacitors. This optimization is made possible because the 3D cylindrical capacitor allows stress application in the tangential, axial, and radial directions, offering a wider range of adjustment options than 2D planar structures. The study focuses on how stress distribution affects ferroelectric phase orientation in hafnium-based materials when the diameters of cylindrical capacitors are varied. First, stress simulations are conducted to analyze the stress distribution in cylindrical capacitors with different diameters. The results indicate that the hafnium oxide layer experiences increased radical stress as the capacitor diameter decreases. Subsequently, capacitors with two different diameters are fabricated, significantly improving the polarization orientation in the thinner one. It is found that the capacitor diameter and the polarization orientation are strongly related through the correlation analysis. Finally, we demonstrate the improvement in the polarization orientation of ferroelectric thin films by radical stress through first-principles calculations. This study provides valuable insights into how stress distribution influences polarization orientation in hafnium-based ferroelectric films and is crucial for advancing the use of ferroelectric materials in future technologies.

AIP AdvancesVol. 15(2)
Chinese Academy of Sciences (CN), University of Chinese Academy of Sciences (CN)
National Key Research and Development Program of China
Openalex Percentile: Top 20%
Ferroelectric and Negative Capacitance Devices
1.46
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