Nondestructive analysis of threading mixed dislocations in SiC using x-ray topography and birefringence

In this study, we combined x-ray topography (XRT) and birefringence imaging to identify the Burgers vectors in threading mixed dislocations (TMDs) in SiC. XRT was utilized to determine the screw components of the Burgers vectors, while the edge components were ascertained using birefringence images obtained by polarized light microscopy. Our analysis, validated against transmission electron microscopy and large-angle convergent beam electron diffraction, provides a novel, nondestructive approach for examining defects in SiC power devices. The results demonstrate a significant advancement in the characterization of TMDs, contributing insights into enhancing the quality and reliability of semiconductor devices. This research paves the way for future developments in SiC technology, highlighting the importance of a detailed dislocation analysis in the field of semiconductor materials.

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Publication Details

Journal
AIP Advances
Published
2025-02-01
DOI
https://doi.org/10.1063/5.0238854
Citations
5
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
3.65

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article

Nondestructive analysis of threading mixed dislocations in SiC using x-ray topography and birefringence

Shunta Harada, Seiya Mizutani, Yuya Mizutani, Shohei Hayashi et al.
5 citations
AIP Advances
Silicon Carbide Semiconductor Technologies
3.65
article

Nondestructive analysis of threading mixed dislocations in SiC using x-ray topography and birefringence

Shunta Harada, Seiya Mizutani, Yuya Mizutani, Shohei Hayashi, S. Mizutani, Yasutaka Matsubara, Michio Kawase, Keisuke Seo, Kenta Murayama
article en
5 citations

Abstract

In this study, we combined x-ray topography (XRT) and birefringence imaging to identify the Burgers vectors in threading mixed dislocations (TMDs) in SiC. XRT was utilized to determine the screw components of the Burgers vectors, while the edge components were ascertained using birefringence images obtained by polarized light microscopy. Our analysis, validated against transmission electron microscopy and large-angle convergent beam electron diffraction, provides a novel, nondestructive approach for examining defects in SiC power devices. The results demonstrate a significant advancement in the characterization of TMDs, contributing insights into enhancing the quality and reliability of semiconductor devices. This research paves the way for future developments in SiC technology, highlighting the importance of a detailed dislocation analysis in the field of semiconductor materials.

AIP AdvancesVol. 15(2)
Toray (United States) (US), Nagoya University (JP)
New Energy and Industrial Technology Development Organization
Openalex Percentile: Top 8%
Silicon Carbide Semiconductor Technologies
3.65
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