Unveiling the Correlation between Defects and High Mobility in MoS<sub>2</sub> Monolayers

Defects in semiconductors play a crucial role in modifying their electronic structure and transport properties. In transition metal dichalcogenides, atomic chalcogen vacancies are a primary source of intrinsic defects. While the impact of these vacancies on electrical transport has been widely studied, their exact role remains not fully understood. In this work, we correlate optical spectroscopy, low-temperature electrical transport measurements, scanning tunneling microscopy (STM), and first-principles density functional theory (DFT) calculations to explore the effect of chalcogen vacancies in MoS<sub>2</sub> monolayers grown by chemical vapor deposition. We specifically highlight the role of disulfur vacancies in modulating electrical properties, showing that these defects increase the density of shallow donor states near the conduction band, which facilitates electron hopping conduction, as evidenced by low-temperature transport and STM measurements. These findings are further supported by DFT calculations, which reveal that the electronic states associated with these defects are relatively delocalized, promoting hopping conduction and inducing n-type doping. This mechanism accounts for the observed high field-effect mobility (>100 cm<sup>2</sup> V<sup>-1</sup>s<sup>-1</sup>) in the samples. These findings highlight the potential for defect engineering as a universal approach to customizing the properties of 2D materials for various applications.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2025-02-05
DOI
https://doi.org/10.1021/acsami.4c18552
Citations
7
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
3.62

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article

Unveiling the Correlation between Defects and High Mobility in MoS2 Monolayers

Atikur Rahman, Rahul Chand, Gokul M. Anilkumar, S. P. Majumder et al.
7 citations
ACS Applied Materials & Interfaces
2D Materials and Applications
3.62
article

Unveiling the Correlation between Defects and High Mobility in MoS2 Monolayers

Atikur Rahman, Rahul Chand, Gokul M. Anilkumar, S. P. Majumder, Sooyeon Hwang, Aparna Deshpande, G. V. Pavan Kumar, Vaibhav Walve, Prasenjit Ghosh, Sarika Lohkna
article en
7 citations

Abstract

Defects in semiconductors play a crucial role in modifying their electronic structure and transport properties. In transition metal dichalcogenides, atomic chalcogen vacancies are a primary source of intrinsic defects. While the impact of these vacancies on electrical transport has been widely studied, their exact role remains not fully understood. In this work, we correlate optical spectroscopy, low-temperature electrical transport measurements, scanning tunneling microscopy (STM), and first-principles density functional theory (DFT) calculations to explore the effect of chalcogen vacancies in MoS<sub>2</sub> monolayers grown by chemical vapor deposition. We specifically highlight the role of disulfur vacancies in modulating electrical properties, showing that these defects increase the density of shallow donor states near the conduction band, which facilitates electron hopping conduction, as evidenced by low-temperature transport and STM measurements. These findings are further supported by DFT calculations, which reveal that the electronic states associated with these defects are relatively delocalized, promoting hopping conduction and inducing n-type doping. This mechanism accounts for the observed high field-effect mobility (>100 cm<sup>2</sup> V<sup>-1</sup>s<sup>-1</sup>) in the samples. These findings highlight the potential for defect engineering as a universal approach to customizing the properties of 2D materials for various applications.

ACS Applied Materials & InterfacesVol. 17(7)
Brookhaven National Laboratory (US), Nanomaterials Research (United States) (US), Center for Functional Nanomaterials
Simons Foundation, Council of Scientific and Industrial Research, India, Abdus Salam International Centre for Theoretical Physics, Indo-French Centre for the Promotion of Advanced Research, Ministry of Education, India, Indian Institute of Science Education and Research Pune, Science and Engineering Research Board
Openalex Percentile: Top 7%
2D Materials and Applications
3.62
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