Wavelength dependence of thermoreflectance coefficient of TiNi thin film
Abstract The temperature dependence of the reflectance of TiNi thin films was measured using a developed temperature modulation-free thermoreflectance measurement equipment integrated with a precise temperature control system. Consequently, the temperature dependence of the reflectance was successfully measured at three wavelengths with uncertainties confined to within ±3% at 80 °C. In addition, a very low temperature dependence of the reflectance of the order of 10 −6 [1 °C −1 ] was confirmed. The linearity uncertainty of the temperature dependence of the reflectance was evaluated and determined to be within ±15.52%.
Authors
- Taichi Murakami (ORCID: https://orcid.org/0000-0002-5211-4160)
- Toshiyuki Tsuchiya (ORCID: https://orcid.org/0000-0002-7846-5831)
- Masaki Shimofuri (ORCID: https://orcid.org/0000-0001-8043-1238)
- Shugo Miyake (ORCID: https://orcid.org/0009-0003-7564-7810)
Publication Details
- Journal
- Japanese Journal of Applied Physics
- Published
- 2025-02-05
- DOI
- https://doi.org/10.35848/1347-4065/adb299
- Citations
- 3
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 3.77