An Authentic Al=Si Double Bond

Abstract Aluminatasilenes are the elusive heavier counterparts of the well‐known borataalkenes in which the B=C double bond is formally replaced by an Al=Si moiety. We report the isolation of a four‐membered anionic AlSi 3 cycle with a bona fide Al=Si double bond, which is obtained by the reaction of 2 eq. of disilenide Tip 2 Si=SiTipLi with H 2 AlCl (Tip=2,4,6‐triisopropylphenyl). X‐ray crystallography, UV/Vis spectroscopy and computational analysis confirm the double bond character with a very short Al−Si bond of 2.283(1) Å and high Wiberg bond index (WBI) of 1.31. Intramolecular C−H activation by the Al=Si bond and the reactions with sulfur sources confirm typical double bond reactivity.

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Publication Details

Journal
Angewandte Chemie International Edition
Published
2025-02-05
DOI
https://doi.org/10.1002/anie.202422007
Citations
7
Primary Topic
Semiconductor materials and interfaces
Type
article
Field-Weighted Citation Impact
8.73

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article

An Authentic Al=Si Double Bond

Bernd Morgenstern, Ankur Ankur, David Scheschkewitz, Nasrina Parvin
7 citations
Angewandte Chemie International Edition
Semiconductor materials and interfaces
8.73
article

An Authentic Al=Si Double Bond

Bernd Morgenstern, Ankur Ankur, David Scheschkewitz, Nasrina Parvin
article en
7 citations

Abstract

Abstract Aluminatasilenes are the elusive heavier counterparts of the well‐known borataalkenes in which the B=C double bond is formally replaced by an Al=Si moiety. We report the isolation of a four‐membered anionic AlSi 3 cycle with a bona fide Al=Si double bond, which is obtained by the reaction of 2 eq. of disilenide Tip 2 Si=SiTipLi with H 2 AlCl (Tip=2,4,6‐triisopropylphenyl). X‐ray crystallography, UV/Vis spectroscopy and computational analysis confirm the double bond character with a very short Al−Si bond of 2.283(1) Å and high Wiberg bond index (WBI) of 1.31. Intramolecular C−H activation by the Al=Si bond and the reactions with sulfur sources confirm typical double bond reactivity.

Angewandte Chemie International EditionVol. 64(16)
Saarland University (DE)
Alexander von Humboldt-Stiftung, Deutsche Forschungsgemeinschaft, Universität des Saarlandes
Openalex Percentile: Top 2%
Semiconductor materials and interfaces
8.73
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