Investigating the effect of termination capacitor on E–H mode transition in radio frequency inductively coupled plasma

In this work, the effects of stringing termination capacitors on the external circuit parameters, plasma parameters, and mode transition in radio frequency (RF) inductively coupled Ar discharges are investigated. It has been demonstrated that at low pressure (1 Pa), in the absence of termination capacitors, the plasma parameters and external circuit parameters exhibit a continuous variation with increasing RF power. The plasma density is observed to decrease with decreasing capacitance value in the E mode when the termination capacitor is inserted, while the plasma density is increased with decreasing capacitance value in the H mode. During the E–H mode transition process, both the plasma parameters and the external circuit parameters undergo a discontinuous change characterized by a distinct “jump” in each parameter. By increasing and then decreasing RF power, the evolution of each parameter creates a significant hysteresis. As the termination capacitance decreases, the power threshold of the H–E mode transition decreases, resulting in a larger hysteresis loop. The termination capacitor, which is connected in series at the end of the coil, can alter the voltage distribution on the RF antenna. This alteration results in a reduction in the potential difference between the coil and the “common ground,” which effectively diminishes the electrostatic field. Furthermore, the electron energy probability function indicates that the addition of the termination capacitor results in a reduction in the proportion of energetic electrons in the E mode, accompanied by a reduction in the plasma potential.

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Publication Details

Journal
Journal of Applied Physics
Published
2025-02-05
DOI
https://doi.org/10.1063/5.0233687
Citations
2
Primary Topic
Plasma Diagnostics and Applications
Type
article
Field-Weighted Citation Impact
1.46

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article

Investigating the effect of termination capacitor on E–H mode transition in radio frequency inductively coupled plasma

Fei Gao, You‐Nian Wang, Liyue Gong, Xinjie Wang et al.
2 citations
Journal of Applied Physics
Plasma Diagnostics and Applications
1.46
article

Investigating the effect of termination capacitor on E–H mode transition in radio frequency inductively coupled plasma

Fei Gao, You‐Nian Wang, Liyue Gong, Xinjie Wang, X. R. Lyu
article en
2 citations

Abstract

In this work, the effects of stringing termination capacitors on the external circuit parameters, plasma parameters, and mode transition in radio frequency (RF) inductively coupled Ar discharges are investigated. It has been demonstrated that at low pressure (1 Pa), in the absence of termination capacitors, the plasma parameters and external circuit parameters exhibit a continuous variation with increasing RF power. The plasma density is observed to decrease with decreasing capacitance value in the E mode when the termination capacitor is inserted, while the plasma density is increased with decreasing capacitance value in the H mode. During the E–H mode transition process, both the plasma parameters and the external circuit parameters undergo a discontinuous change characterized by a distinct “jump” in each parameter. By increasing and then decreasing RF power, the evolution of each parameter creates a significant hysteresis. As the termination capacitance decreases, the power threshold of the H–E mode transition decreases, resulting in a larger hysteresis loop. The termination capacitor, which is connected in series at the end of the coil, can alter the voltage distribution on the RF antenna. This alteration results in a reduction in the potential difference between the coil and the “common ground,” which effectively diminishes the electrostatic field. Furthermore, the electron energy probability function indicates that the addition of the termination capacitor results in a reduction in the proportion of energetic electrons in the E mode, accompanied by a reduction in the plasma potential.

Journal of Applied PhysicsVol. 137(5)
Dalian University of Technology (CN), Materials Modification (United States) (US)
National Natural Science Foundation of China
Openalex Percentile: Top 20%
Plasma Diagnostics and Applications
1.46
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