Investigation of Inhibited String Characteristics According to Dimple Structures in 3D NAND Flash Memory

In this letter, we investigated the boosted channel potential (V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula>) in inhibited strings with dimple (concave and convex) structures and analyzed the program (PGM) disturbance caused by <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\mathbf {{ch}}}$ </tex-math></inline-formula>. In concave structures, the electric field (e-field) concentrated in the spacer (SP) region, resulting in a decrease in V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula> as the degree of concavity increases. In convex structures, the e-field concentrates in the center of the word line (WL) region, boosting <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\mathbf {{ch}}}$ </tex-math></inline-formula> as the degree of convexity increases. This occurs due to the dispersion or concentration of the PGM voltage applied to the WL. High V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula> in the selected WL increases the potential difference (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta $ </tex-math></inline-formula>V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula>) between adjacent WLs. Due to structural characteristics, the lateral e-field (E<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {m}}$ </tex-math></inline-formula>) is largest in concave structures, whereas the vertical e-field (E<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ox}}}$ </tex-math></inline-formula>) dominates in convex structures. Consequently, PGM disturb characteristics caused by hot carrier injection (HCI) are significantly degraded in convex structures.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-02-03
DOI
https://doi.org/10.1109/led.2025.3531354
Citations
5
Primary Topic
Advanced Data Storage Technologies
Type
article
Field-Weighted Citation Impact
7.44

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article

Investigation of Inhibited String Characteristics According to Dimple Structures in 3D NAND Flash Memory

Myounggon Kang, Jesun Park
5 citations
IEEE Electron Device Letters
Advanced Data Storage Technologies
7.44
article

Investigation of Inhibited String Characteristics According to Dimple Structures in 3D NAND Flash Memory

Myounggon Kang, Jesun Park
article en
5 citations

Abstract

In this letter, we investigated the boosted channel potential (V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula>) in inhibited strings with dimple (concave and convex) structures and analyzed the program (PGM) disturbance caused by <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\mathbf {{ch}}}$ </tex-math></inline-formula>. In concave structures, the electric field (e-field) concentrated in the spacer (SP) region, resulting in a decrease in V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula> as the degree of concavity increases. In convex structures, the e-field concentrates in the center of the word line (WL) region, boosting <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$V_{\mathbf {{ch}}}$ </tex-math></inline-formula> as the degree of convexity increases. This occurs due to the dispersion or concentration of the PGM voltage applied to the WL. High V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula> in the selected WL increases the potential difference (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta $ </tex-math></inline-formula>V<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ch}}}$ </tex-math></inline-formula>) between adjacent WLs. Due to structural characteristics, the lateral e-field (E<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {m}}$ </tex-math></inline-formula>) is largest in concave structures, whereas the vertical e-field (E<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathbf {\textit {ox}}}$ </tex-math></inline-formula>) dominates in convex structures. Consequently, PGM disturb characteristics caused by hot carrier injection (HCI) are significantly degraded in convex structures.

IEEE Electron Device LettersVol. 46(3)
University of Seoul (KR), Seoul Semiconductor (South Korea) (KR)
Ministry of Trade, Industry and Energy, Ministry of Science and ICT, South Korea
Openalex Percentile: Top 3%
Advanced Data Storage Technologies
7.44
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