5-kV SiC Deep-Implanted Superjunction MOSFETs

This work presents the development and characterization of 5kV deep-implanted SiC superjunction (SJ) MOSFETs. In these switches, the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$36\mu $ </tex-math></inline-formula>m deep n-type and p-type SJ pillars were formed using three rounds of epitaxial overgrowth and ultra-high-energy implantation (UHEI). We successfully fabricated SJ MOSFETs with pillar pitches of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$8\mu $ </tex-math></inline-formula>m, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10\mu $ </tex-math></inline-formula>m, and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$12\mu $ </tex-math></inline-formula>m, achieving an R<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathsf {\textbf {on,sp}}}$ </tex-math></inline-formula> of 9.5 m<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Omega $ </tex-math></inline-formula> <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\cdot $ </tex-math></inline-formula>cm2 at room temperature, which is 25% below the SiC unipolar limit. The devices also demonstrated sharp avalanche breakdown at 5.1kV with low leakage current density.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-01-29
DOI
https://doi.org/10.1109/led.2025.3536382
Citations
7
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
5.11

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article

5-kV SiC Deep-Implanted Superjunction MOSFETs

Eladio Delgado, Reza Ghandi, Collin Hitchcock, Tarak Saha et al.
7 citations
IEEE Electron Device Letters
Silicon Carbide Semiconductor Technologies
5.11
article

5-kV SiC Deep-Implanted Superjunction MOSFETs

Eladio Delgado, Reza Ghandi, Collin Hitchcock, Tarak Saha, Stacey Kennerley
article en
7 citations

Abstract

This work presents the development and characterization of 5kV deep-implanted SiC superjunction (SJ) MOSFETs. In these switches, the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$36\mu $ </tex-math></inline-formula>m deep n-type and p-type SJ pillars were formed using three rounds of epitaxial overgrowth and ultra-high-energy implantation (UHEI). We successfully fabricated SJ MOSFETs with pillar pitches of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$8\mu $ </tex-math></inline-formula>m, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$10\mu $ </tex-math></inline-formula>m, and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$12\mu $ </tex-math></inline-formula>m, achieving an R<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\mathsf {\textbf {on,sp}}}$ </tex-math></inline-formula> of 9.5 m<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Omega $ </tex-math></inline-formula> <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\cdot $ </tex-math></inline-formula>cm2 at room temperature, which is 25% below the SiC unipolar limit. The devices also demonstrated sharp avalanche breakdown at 5.1kV with low leakage current density.

IEEE Electron Device LettersVol. 46(4)
GE Global Research (United States) (US)
Advanced Research Projects Agency - Energy
Reduced inequalities
Openalex Percentile: Top 5%
Silicon Carbide Semiconductor Technologies
5.11
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5-kV SiC Deep-Implanted Superjunction MOSFETs — Eladio Delgado, Reza Ghandi, et al. · IEEE Electron Device Letters (2025) | TGRS Research Map | TGRS