Current Status of EUV Flood Exposure Tool at NewSUBARU BL03

Challenges of EUV lithography include the development of resists with high resolution, high sensitivity, low line-width roughness, and low outgassing. Thus, our research group has developed various evaluation systems installed at the NewSUBARU synchrotron radiation facility and promoted research for EUV lithography. In particular, BL03 is a beamline specialized for EUV flood exposure for 4-inch wafer and used to evaluate sensitivity and outgassing of resists.