Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material

Photo-adhesive materials for adhesion between dissimilar materials have been desired in industrial manufacturing. We designed and synthesized a methacryl monomer having a 6-chloropyridyl group. A photo-adhesive material was prepared with the monomer, 2-hydroxyethyl methacrylate and a photo-radical initiator. Photo-adhesion was performed between a glass substrate and another substrate (glass, metals, and polymers), with 2 J/cm2 of UV irradiation at a wavelength of 365 nm. Shear stress of 5-12 MPa was recorded, which would result from formation of cured adhesive layer in a radical UV curing process. XPS spectral measurement in the N1s region showed that 6-chloropyridyl group would interact with copper surface through nitrogen atom of the pyridine ring.

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Publication Details

Journal
Journal of Photopolymer Science and Technology
Published
2024-12-25
DOI
https://doi.org/10.2494/photopolymer.37.569
Primary Topic
Photopolymerization techniques and applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material

Masahiro Furutani, Wataru Usui, Masaki Matsui
Journal of Photopolymer Science and Technology
Photopolymerization techniques and applications
article

Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material

Masahiro Furutani, Wataru Usui, Masaki Matsui
article en

Abstract

Photo-adhesive materials for adhesion between dissimilar materials have been desired in industrial manufacturing. We designed and synthesized a methacryl monomer having a 6-chloropyridyl group. A photo-adhesive material was prepared with the monomer, 2-hydroxyethyl methacrylate and a photo-radical initiator. Photo-adhesion was performed between a glass substrate and another substrate (glass, metals, and polymers), with 2 J/cm2 of UV irradiation at a wavelength of 365 nm. Shear stress of 5-12 MPa was recorded, which would result from formation of cured adhesive layer in a radical UV curing process. XPS spectral measurement in the N1s region showed that 6-chloropyridyl group would interact with copper surface through nitrogen atom of the pyridine ring.

Journal of Photopolymer Science and TechnologyVol. 37(6)
Fukui National College of Technology (JP)
Japan Society for the Promotion of Science
Openalex Percentile: Top 81%
Photopolymerization techniques and applications
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