The Impact of Passivation on the Direct-current and Radio-frequency Performance of GaN/AlGaN HEMT Transistors on Si Substrates
An innovative surface passivation technique for High Electron Mobility Transistor (HEMT) devices has been documented. The DC and RF characterization were carried out on a 0.25 µm × (2 × 150) µm gate HEMT. This shows that the passivated device delivers enhanced performance, achieving a peak increase in drain-source current of 0.23 A/mm and a maximum transconductance of 90 mS/mm. Specifically, this device presents outstanding RF performance in terms of small-signal characteristics, boasting a current gain cut-off frequency (Ft) of 33.2 GHz and maximum oscillation frequencies (fmax) reaching 40.1 GHz. A 16-element conventional GaN-based HEMT small-signal model (SSM) is extracted and the modeling approach is validated by conducting a comparison between the simulated small-signal S-parameters and the measured data across a broad frequency spectrum.
Authors
- M. Gassoumi
- Fikria Jabli (ORCID: https://orcid.org/0009-0002-7666-5183)
- Hana Mosbahi
- Abdelaziz Gassoumi (ORCID: https://orcid.org/0000-0002-2062-2996)
- Akrem Essaoudi
- Maged S. Al‐Fakeh (ORCID: https://orcid.org/0000-0001-5881-4427)
Institutions
- Tunis University (TN)
- Qassim University (SA)
- University of Monastir (TN)
- Buraydah Colleges (SA)
- Tunis El Manar University (TN)
Publication Details
- Journal
- Semiconductors
- Published
- 2024-12-01
- DOI
- https://doi.org/10.1134/s1063782624601560
- Citations
- 6
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 1.87