SCIL: Advanced precision in slanted gratings, overlay alignment, and high refractive index imprint materials

SCIL offers a superior approach to nanoimprint lithography for the fabrication of slanted gratings, achieving high overlay alignment accuracy, and effectively utilizing high refractive index imprint materials. These capabilities position SCIL as a leading NIL technology in the field for advanced nanofabrication applications.

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Publication Details

Published
2025-01-23
DOI
https://doi.org/10.1117/12.3041104
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
Field-Weighted Citation Impact
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SCIL: Advanced precision in slanted gratings, overlay alignment, and high refractive index imprint materials

T. de Jong, Robert van de Laar, Marc A. Verschuuren, Rob Voorkamp et al.
Nanofabrication and Lithography Techniques
article

SCIL: Advanced precision in slanted gratings, overlay alignment, and high refractive index imprint materials

T. de Jong, Robert van de Laar, Marc A. Verschuuren, Rob Voorkamp, Gert-Jan Hurxkens, Jeroen Visser, Marta Martinez-Moro
article en

Abstract

SCIL offers a superior approach to nanoimprint lithography for the fabrication of slanted gratings, achieving high overlay alignment accuracy, and effectively utilizing high refractive index imprint materials. These capabilities position SCIL as a leading NIL technology in the field for advanced nanofabrication applications.

Openalex Percentile: Top 99%
Nanofabrication and Lithography Techniques
DOISourceOpenAlex
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SCIL: Advanced precision in slanted gratings, overlay alignment, and high refractive index imprint materials — T. de Jong, Robert van de Laar, et al. · (2025) | TGRS Research Map | TGRS