Anti-Reflection Layer Enhanced Absorption of Laser-Induced Phase-Change RF Switch

An anti-reflection layer is employed in this study to facilitate the optical switching of GeTe phase-change material, thereby enhancing the efficiency of laser utilization. The film serves a dual purpose by improving optical absorption and providing dielectric passivation for the device. The present work involves the design of anti-reflective layers using different materials, with a comparative analysis of their impact on reducing power consumption. Simulation results demonstrate that the reflection rate of the laser equipped with an anti-reflective layer can be reduced to less than 27% at a wavelength of 532nm. Furthermore, compared to switches lacking an anti-reflective film, the energy density required for amorphization can be decreased from 160 mJ/cm2 to 95 mJ/cm2, effectively lowering the energy threshold for amorphization switching.

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Publication Details

Published
2024-10-23
DOI
https://doi.org/10.1109/isape62431.2024.10840879
Primary Topic
Phase-change materials and chalcogenides
Type
article
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article

Anti-Reflection Layer Enhanced Absorption of Laser-Induced Phase-Change RF Switch

Xinyu Ma, Yajing Li, Sixian Qian, Yunqi Fu et al.
Phase-change materials and chalcogenides
article

Anti-Reflection Layer Enhanced Absorption of Laser-Induced Phase-Change RF Switch

Xinyu Ma, Yajing Li, Sixian Qian, Yunqi Fu, Qiang Chen
article en

Abstract

An anti-reflection layer is employed in this study to facilitate the optical switching of GeTe phase-change material, thereby enhancing the efficiency of laser utilization. The film serves a dual purpose by improving optical absorption and providing dielectric passivation for the device. The present work involves the design of anti-reflective layers using different materials, with a comparative analysis of their impact on reducing power consumption. Simulation results demonstrate that the reflection rate of the laser equipped with an anti-reflective layer can be reduced to less than 27% at a wavelength of 532nm. Furthermore, compared to switches lacking an anti-reflective film, the energy density required for amorphization can be decreased from 160 mJ/cm2 to 95 mJ/cm2, effectively lowering the energy threshold for amorphization switching.

National University of Defense Technology (CN)
Affordable and clean energy
Openalex Percentile: Top 83%
Phase-change materials and chalcogenides
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