Construction and development of an ultrasonic spray pyrolysis system for semiconductor thin films deposition to photovoltaic applications

The ultrasonic spray pyrolysis (UPS) technique is an efficient method for depositing high-quality thin films, offering advantages over traditional methods. This paper presents the construction and development of a USP system designed for semiconductor thin films used in photovoltaic applications. It provides an overview of the technique, including the setup, material preparation, and process control. The results demonstrate the system's ability to produce uniform, high-quality films, underscoring its potential to advance semiconductor research and inspire new applications in photovoltaics.