Antiferroelectric hafnia down to the 2D limit

Antiferroelectricity is a material property characterized by alternating electric dipoles spontaneously ordered in antiparallel directions. Antiferroelectrics are promising for energy storage, solid-state cooling, and memory technologies; however, these materials are scarce, and their scalability remains largely unexplored. In this work, we demonstrate that single-crystalline hafnia, a lead-free CMOS-compatible material, exhibits antiferroelectricity under compressive-strain conditions. We observe antiparallel sublattice polarization and stable double-hysteresis in single-crystalline (111)-oriented epitaxial La-doped hafnia films grown on yttrium-stabilized zirconia and show that the antipolar orthorhombic phase of hafnia adheres to the Kittel model of antiferroelectricity. Notably, compressive strain strengthens the orthorhombic order in thinner La-doped hafnia films, achieving a very high ordering temperature of 850°C in the two-dimensional limit, highlighting hafnia’s potential for advanced antiferroelectric devices.

Authors

Institutions

Publication Details

Journal
Science
Published
2026-09-24
DOI
https://doi.org/10.1126/science.ady5526
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
0.00

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
article

Antiferroelectric hafnia down to the 2D limit

Evgeny Y. Tsymbal, Pratyush Buragohain, Alexei L. Gruverman, Pravan Omprakash et al.
Science
Ferroelectric and Negative Capacitance Devices
article

Antiferroelectric hafnia down to the 2D limit

Evgeny Y. Tsymbal, Pratyush Buragohain, Alexei L. Gruverman, Pravan Omprakash, Xiaoshan Xu, Jordan A. Hachtel, Miaofang Chi, Huibo B. Cao, Rohan Mishra, Guodong Ren, Yu Yun, Kartik Samanta, Andrew R. Lupini, Xin Li, Haidong Lu
article en

Abstract

Antiferroelectricity is a material property characterized by alternating electric dipoles spontaneously ordered in antiparallel directions. Antiferroelectrics are promising for energy storage, solid-state cooling, and memory technologies; however, these materials are scarce, and their scalability remains largely unexplored. In this work, we demonstrate that single-crystalline hafnia, a lead-free CMOS-compatible material, exhibits antiferroelectricity under compressive-strain conditions. We observe antiparallel sublattice polarization and stable double-hysteresis in single-crystalline (111)-oriented epitaxial La-doped hafnia films grown on yttrium-stabilized zirconia and show that the antipolar orthorhombic phase of hafnia adheres to the Kittel model of antiferroelectricity. Notably, compressive strain strengthens the orthorhombic order in thinner La-doped hafnia films, achieving a very high ordering temperature of 850°C in the two-dimensional limit, highlighting hafnia’s potential for advanced antiferroelectric devices.

Science
University of Nebraska–Lincoln (US), Oak Ridge National Laboratory (US), Pacific Northwest National Laboratory (US), Jaypee Institute of Information Technology (IN), University of Washington (US), Washington University in St. Louis (US)
National Science Foundation, U.S. Department of Energy, Intel Corporation, Office of Science, Division of Materials Research, Office of Advanced Cyberinfrastructure, Division of Electrical, Communications and Cyber Systems, Basic Energy Sciences, Oak Ridge National Laboratory
Openalex Percentile: Top 100%
Ferroelectric and Negative Capacitance Devices
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.