Fabrication of Micro-Led Arrays Based on Laser Interference Lithography and Nano-Imprint

Nowadays, Micro-LEDs are becoming as new generation display technology. Compared with LCD and OLED, Micro-LED has higher luminous efficiency, high contrast ratio, longer lifetime and energy consumption is only 30% of LCD. Using UV or blue light to exite the luminescent medium to achieve full-color display has low power consumption and simple process, which has a better prospect in the field of industrialization. Compared with phosphor powder, quantum dots have excellent luminous characteristics, pure luminous color, and can achieve a wider color gamut. And high resolution quantum dot based color converters (QDCCs) are preferred to fabricate Micro-leds. Patterning techniques of QDCCs include inkjet printing, photo-lithography and nano-imprint. We propose to fabricate graphic quantum dot films based on laser interference lithography and nano-imprint. Interference lithography can directly produce large areas of periodic patterns. Such quantum dot films can be used for full-color display of Micro-led, which can be applied to high-resolution graphics display such as AR and VR. The minimum pixel size of the fabricated graphic quantum dot is less than 2μm, and it has good luminous characteristics. By adding a backlight source, the corresponding light can be excited, so as to realize the full color display.