On-Chip Integration of GaN-Based Metal Oxide Semiconductor Field Effect Transistor and Ultraviolet Light-Emitting Diode

This paper presents an effective on-chip integration of a GaN-based metal-oxide-semiconductor field-effect transistor (MOSFET) and an ultraviolet light-emitting diode (UV LED) on a GaN-on-Si LED epitaxial (epi) wafer, designed and simulated using Silvaco TCAD. In the proposed structure, the drain of the MOSFET and the cathode of the UVLED share the same n-AlGaN layer, effectively reducing parasitic effects and improving device reliability and stability. The simulated MOSFET exhibits a maximum output current of 121 mA/mm and a peak transconductance <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(\mathrm{G}_{\mathrm{m}})$</tex> of 18.92 mS/mm. The designed UV LED emits at a wavelength of 392 nm with a threshold voltage of 3.1 V. Simulation results indicate that our MOSFET can effectively modulate the light output and output current of the integrated UV LED. This approach offers promising potential for applications in UV light communication and biomedicine.

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Publication Details

Published
2024-11-18
DOI
https://doi.org/10.1109/sslchinaifws64644.2024.10835345
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
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article

On-Chip Integration of GaN-Based Metal Oxide Semiconductor Field Effect Transistor and Ultraviolet Light-Emitting Diode

Pengzhan Liu, Jinlong Piao, Jiabin Yan, Ziqi Ye et al.
GaN-based semiconductor devices and materials
article

On-Chip Integration of GaN-Based Metal Oxide Semiconductor Field Effect Transistor and Ultraviolet Light-Emitting Diode

Pengzhan Liu, Jinlong Piao, Jiabin Yan, Ziqi Ye, Yongjin Wang, Fang Wang, Yuling Ding, Yuhuai Liu, Xin Yao, Linning Wang, Yanzhe Wang, Youtian Niu
article en

Abstract

This paper presents an effective on-chip integration of a GaN-based metal-oxide-semiconductor field-effect transistor (MOSFET) and an ultraviolet light-emitting diode (UV LED) on a GaN-on-Si LED epitaxial (epi) wafer, designed and simulated using Silvaco TCAD. In the proposed structure, the drain of the MOSFET and the cathode of the UVLED share the same n-AlGaN layer, effectively reducing parasitic effects and improving device reliability and stability. The simulated MOSFET exhibits a maximum output current of 121 mA/mm and a peak transconductance <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$(\mathrm{G}_{\mathrm{m}})$</tex> of 18.92 mS/mm. The designed UV LED emits at a wavelength of 392 nm with a threshold voltage of 3.1 V. Simulation results indicate that our MOSFET can effectively modulate the light output and output current of the integrated UV LED. This approach offers promising potential for applications in UV light communication and biomedicine.

Zhengzhou University (CN), Nanjing University of Posts and Telecommunications (CN), Henan Normal University (CN)
National Science Foundation, Arizona State University, National Key Research and Development Program of China
Affordable and clean energy
Openalex Percentile: Top 84%
GaN-based semiconductor devices and materials
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