Investigation on the Impact of Gate Field Plate Structure on the Capacitance Characteristics of GaN-Based Power HEMT Device

The outstanding high-frequency characteristics of GaN materials have yet to be fully exploited, and issues related to capacitance properties and dynamic losses need to be addressed. This paper deconstructs the capacitance, providing clear definitions for device capacitance at various levels including device testing, packaging, and underlying structural materials. By taking the gate field plate length as a variable, it elucidates the impact mechanism of GaN power device structural parameters on capacitance characteristics. Furthermore, specific design recommendations for device structures are provided in response to losses in specific circuit topologies. These findings hold significant implications for guiding improvements in system efficiency and power density in high-frequency applications of GaN power devices.

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Publication Details

Published
2024-11-18
DOI
https://doi.org/10.1109/sslchinaifws64644.2024.10835342
Citations
2
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.62
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article

Investigation on the Impact of Gate Field Plate Structure on the Capacitance Characteristics of GaN-Based Power HEMT Device

Zhongqiang Luo, Yang Liu, Lekang Fan, Ying Wang et al.
2 citations
GaN-based semiconductor devices and materials
0.62
article

Investigation on the Impact of Gate Field Plate Structure on the Capacitance Characteristics of GaN-Based Power HEMT Device

Zhongqiang Luo, Yang Liu, Lekang Fan, Ying Wang, Shijie Xu, Jinwei Zhang, Zilin Wu
article en
2 citations

Abstract

The outstanding high-frequency characteristics of GaN materials have yet to be fully exploited, and issues related to capacitance properties and dynamic losses need to be addressed. This paper deconstructs the capacitance, providing clear definitions for device capacitance at various levels including device testing, packaging, and underlying structural materials. By taking the gate field plate length as a variable, it elucidates the impact mechanism of GaN power device structural parameters on capacitance characteristics. Furthermore, specific design recommendations for device structures are provided in response to losses in specific circuit topologies. These findings hold significant implications for guiding improvements in system efficiency and power density in high-frequency applications of GaN power devices.

Sun Yat-sen University (CN)
Affordable and clean energy
Openalex Percentile: Top 31%
GaN-based semiconductor devices and materials
0.62
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Investigation on the Impact of Gate Field Plate Structure on the Capacitance Characteristics of GaN-Based Power HEMT Device — Zhongqiang Luo, Yang Liu, et al. · (2024) | TGRS Research Map | TGRS