0.15 μm GaN HPA MMIC for 6G Upper-Mid Band

This paper presents the characteristics of ETRI's <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{0.15}\ \boldsymbol{\mu} \mathbf{m}$</tex> GaN high-electron-mobility transistor (HEMT) and high-power amplifier (HPA) monolithic microwave integrated circuits (MMICs) for the 6G upper-mid band. To realize the high output power and efficiency characteristics for 6G communications, a <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{0.15}\ \boldsymbol{\mu} \mathbf{m}$</tex> GaN HEMT and MMIC process was developed. This process developed by ETRI used a modified epitaxial structure and a field plate structure to achieve high voltage stability and enhanced large-signal performance. As measurements of 6F75 GaN HEMT device revealed a cutoff frequency of 40.3 GHz and a maximum oscillation frequency of 159 GHz. Load-pull measurements results at 28 GHz achieved an output power of 31.5 dBm, a PAE of 46%, and a power density of 3.1 W/mm. The fabricated Ku-band HPA MMIC achieved a small signal gain of 28 dB, an output power of 34.6 dBm, and a PAE of 31% over the 15.7~17.3 GHz band.

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Published
2024-10-16
DOI
https://doi.org/10.1109/ictc62082.2024.10827052
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

0.15 μm GaN HPA MMIC for 6G Upper-Mid Band

Hong‐Gu Ji, Kyujun Cho, Byoung‐Gue Min, Hak Jun Kim et al.
GaN-based semiconductor devices and materials
article

0.15 μm GaN HPA MMIC for 6G Upper-Mid Band

Hong‐Gu Ji, Kyujun Cho, Byoung‐Gue Min, Hak Jun Kim, Gyejung Lee, Woojin Chang, Junhyung Jeong, Jongmin Lee, Dong‐Min Kang, Jeman Park
article en

Abstract

This paper presents the characteristics of ETRI's <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{0.15}\ \boldsymbol{\mu} \mathbf{m}$</tex> GaN high-electron-mobility transistor (HEMT) and high-power amplifier (HPA) monolithic microwave integrated circuits (MMICs) for the 6G upper-mid band. To realize the high output power and efficiency characteristics for 6G communications, a <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{0.15}\ \boldsymbol{\mu} \mathbf{m}$</tex> GaN HEMT and MMIC process was developed. This process developed by ETRI used a modified epitaxial structure and a field plate structure to achieve high voltage stability and enhanced large-signal performance. As measurements of 6F75 GaN HEMT device revealed a cutoff frequency of 40.3 GHz and a maximum oscillation frequency of 159 GHz. Load-pull measurements results at 28 GHz achieved an output power of 31.5 dBm, a PAE of 46%, and a power density of 3.1 W/mm. The fabricated Ku-band HPA MMIC achieved a small signal gain of 28 dB, an output power of 34.6 dBm, and a PAE of 31% over the 15.7~17.3 GHz band.

Electronics and Telecommunications Research Institute (KR)
Openalex Percentile: Top 84%
GaN-based semiconductor devices and materials
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