Effects of bias voltage on microstructure and properties of vanadium dioxide films deposited by DC magnetron sputtering
Applying an appropriate bias voltage during direct current magnetron sputtering can optimize the valence state, facilitate phase transition, and improve the performance of deposited VO 2 film.
Authors
- Yongneng Xiao
- Jie Bai (ORCID: https://orcid.org/0000-0002-7662-8238)
- Qiang Wang (ORCID: https://orcid.org/0000-0002-9118-5615)
- Zhenhuai Yang
- Chuandong Zhang (ORCID: https://orcid.org/0009-0002-3100-2415)
- Lei Liu (ORCID: https://orcid.org/0000-0003-3523-060X)
- Hong Liu (ORCID: https://orcid.org/0000-0003-1640-9620)
- Yuanjun Guo (ORCID: https://orcid.org/0000-0002-2213-5489)
- Lang Hu (ORCID: https://orcid.org/0009-0000-1806-4908)
- Qiang Hu (ORCID: https://orcid.org/0000-0001-5048-585X)
Institutions
- Ji Hua Laboratory (CN)
- Chongqing Jiaotong University (CN)
Publication Details
- Journal
- CrystEngComm
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1039/d4ce01211a
- Citations
- 1
- Primary Topic
- Transition Metal Oxide Nanomaterials
- Type
- article
- Field-Weighted Citation Impact
- 0.61