Evaluation of the transcrestal sinus elevation using simple lift kit with simultaneous grafting and implant placement
Abstract Background Rehabilitation of the edentulous maxilla with dental implants is challenging. The transcrestal sinus elevation procedure has become an important preprosthetic surgical procedure for bone creation in the posterior maxilla with implant placement. Purpose This study was planned to evaluate the success of transcrestal sinus elevation using a simple lift kit with simultaneous grafting and placement of implant. Patients and methods A randomized clinical trial was conducted on ten patients with bone height below the floor of the maxillary sinus ranged from 5 to 8 mm, which was indicated for sinus membrane elevation using the simple lift kit. After preparation of the implant site and osteotomy, sinus membrane elevation using the simple lift kit and augmentation using bovine bone with the implant placement using surgical guide were done simultaneously. Osseointegration and bone height were measured using cone beam computed tomography after 6 months. Results Successful sinus membrane grafting using simple lift kit procedures was performed in 10 cases without sinus membrane perforation. A total of 10 implants were placed. The radiographic examination showed the bone height before and after sinus membrane lift was statistically significant, as there the increase in bone height ranged from 2.4 to 4.8 mm. Conclusion The simple lift kit is a minimally invasive technique, associated with very little discomfort and complications, which allows greater control and safety when performing the elevation of the sinus membrane.
Authors
- Abd E.A. Elmongy Sadakah
- Marwa T. Ibrahim (ORCID: https://orcid.org/0009-0003-3760-3622)
- Mahmoud Khalifa
- Ahmed Nabil Saad Abo Emera
Institutions
- Tanta University (EG)
Publication Details
- Journal
- Tanta Dental Journal
- Published
- 2024-10-01
- DOI
- https://doi.org/10.4103/tdj.tdj_35_24
- Primary Topic
- Dental Implant Techniques and Outcomes
- Type
- article
- Field-Weighted Citation Impact
- 0.00