Development of a Fabrication-to-Benchtop Process for SiN-Based Quantum Devices
Silicon nitride has emerged as a key material for the advancement of future quantum communication and computational devices. However, challenges persist in establishing a comprehensive development process, spanning from fabrication to optical characterization, essential for advancing these devices to their next stage of potential. Maintaining control over the entire process, from start to finish, alongside device modeling, enables more efficient and timely iteration and optimization. Here we introduce a fabrication-to-benchtop process. We employ an in-house stoichiometric recipe for device fabrication and conduct comprehensive characterization of optical losses and material properties. Understanding and controlling the refractive index of the device are vital for predicting device geometries and group indices. Implementing the refractive indices of our fabricated devices, we simulate microring resonators and demonstrate their application in generating optical solitons.
Authors
- Khaled Mnaymneh (ORCID: https://orcid.org/0000-0002-1394-1841)
- Patrick Laferrière (ORCID: https://orcid.org/0000-0002-1569-387X)
- R. Niall Tait (ORCID: https://orcid.org/0000-0002-1382-5461)
- Abubaker M. Tareki (ORCID: https://orcid.org/0000-0002-8117-0989)
- Connor Kupchak (ORCID: https://orcid.org/0009-0005-2635-4047)
- Tara Moradi
Institutions
- Carleton University (CA)
Publication Details
- Published
- 2024-09-15
- DOI
- https://doi.org/10.1109/qce60285.2024.00087
- Primary Topic
- Advanced Surface Polishing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00