Study of thin layer materials presenting interfaces using white light interference measurements

Thin layers of materials are widely used for diverse applications, ranging from protective coatings to doping layers. There is currently a strong development of different processes that allow the synthesis of thin layers, that can be organic or non-organic. There exists great interest in measuring their topography since their roughness and texturing are critical characteristics for many applications. Low coherence interferometry can provide both topographic measurements and the spectral response of the probed material in the same position. Not only are the measurements fast but the technique is one of the few that allows measurement of both of these characteristics at the same time. Being non-destructive, this technique could become a standard for materials used in the optoelectronics field.