Advancements and challenges in semiconductor technology: a detailed examination of Gallium Nitride

The rapid advancement of semiconductor technology significantly influences various aspects of modern society by introducing new materials and sophisticated devices that enhance efficiency and performance. Among these materials, Gallium Nitride (GaN) has emerged as a promising semiconductor due to its unique physical and chemical properties. This paper provides a detailed examination of GaN, exploring its properties, advantages, disadvantages, and applications, as well as its role in the future of semiconductor materials. GaN, an inorganic compound with a direct bandgap of 3.4 eV, exhibits a hexagonal wurtzite structure. Its superior electron mobility and saturation drift velocity contribute to its effectiveness in radio frequency and microwave electronic devices. The examination of GaN highlights its potential to revolutionize various industries by enabling high-speed, high-frequency applications and supporting the burgeoning demands of modern technology. Challenges related to the sustainable manufacturing processes, recycling of semiconductor materials, and global trade disputes are also discussed, underscoring the complexities and ongoing needs for innovation within the semiconductor industry.

Authors

Publication Details

Journal
IET conference proceedings.
Published
2025-01-01
DOI
https://doi.org/10.1049/icp.2024.4044
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.26
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article

Advancements and challenges in semiconductor technology: a detailed examination of Gallium Nitride

Yueming Hua
1 citations
IET conference proceedings.
GaN-based semiconductor devices and materials
1.26
article

Advancements and challenges in semiconductor technology: a detailed examination of Gallium Nitride

Yueming Hua
article en
1 citations

Abstract

The rapid advancement of semiconductor technology significantly influences various aspects of modern society by introducing new materials and sophisticated devices that enhance efficiency and performance. Among these materials, Gallium Nitride (GaN) has emerged as a promising semiconductor due to its unique physical and chemical properties. This paper provides a detailed examination of GaN, exploring its properties, advantages, disadvantages, and applications, as well as its role in the future of semiconductor materials. GaN, an inorganic compound with a direct bandgap of 3.4 eV, exhibits a hexagonal wurtzite structure. Its superior electron mobility and saturation drift velocity contribute to its effectiveness in radio frequency and microwave electronic devices. The examination of GaN highlights its potential to revolutionize various industries by enabling high-speed, high-frequency applications and supporting the burgeoning demands of modern technology. Challenges related to the sustainable manufacturing processes, recycling of semiconductor materials, and global trade disputes are also discussed, underscoring the complexities and ongoing needs for innovation within the semiconductor industry.

IET conference proceedings.Vol. 2024(19)
Openalex Percentile: Top 25%
GaN-based semiconductor devices and materials
1.26
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Advancements and challenges in semiconductor technology: a detailed examination of Gallium Nitride — Yueming Hua · IET conference proceedings. (2025) | TGRS Research Map | TGRS