Manufacturing high-performance flexible sensors via advanced patterning techniques
Abstract As a key component in the field of information perception in the age of intelligence, sensors play an important role in areas such as environmental monitoring and human perception. To meet the huge demands for information acquisition in the whole society, the elaborated structure construction of sensors by patterned manufacturing technology is an important way to improve the performance of sensors. The preparation of patterned structures can enhance the interaction between the sensitive material and target matter, increase the contact area between the sensor and the target matter, amplify the effect of target matter on the sensor structure, and enhance the density of information sensing by building arrays. This review presents a comprehensive review of patterned micro-nanostructure manufacturing techniques for performance enhancement of flexible sensors, including printing, exposure lithography, mould method, soft lithography, nanoimprinting lithography, and laser direct writing technology. Meanwhile, the evaluation methods of flexible sensor performance and the influence of patterned structures on sensor performance are introduced. Finally, some practical application examples of patterned manufacturing techniques are also introduced according to flexible sensor types. In addition, the patterned manufacturing techniques applied for performance enhancement of flexible sensor are summarized and outlooked, which can be used as a reference for future patterned manufacturing of flexible sensors.
Authors
- Kaichen Xu (ORCID: https://orcid.org/0000-0003-4957-3144)
- Bowen Zhong (ORCID: https://orcid.org/0000-0001-9365-895X)
- Lili Wang (ORCID: https://orcid.org/0000-0002-0422-4277)
- Nam‐Joon Cho (ORCID: https://orcid.org/0000-0002-8692-8955)
- Zheng Lou (ORCID: https://orcid.org/0000-0001-5744-3759)
- Joshua A. Jackman (ORCID: https://orcid.org/0000-0002-1800-8102)
- Hao Xu (ORCID: https://orcid.org/0000-0002-5125-8381)
- Xiaokun Qin
Institutions
- Nanyang Technological University (SG)
- Institute of Semiconductors (CN)
- University of Chinese Academy of Sciences (CN)
- Zhejiang University (CN)
- Sungkyunkwan University (KR)
Publication Details
- Journal
- International Journal of Extreme Manufacturing
- Published
- 2025-01-09
- DOI
- https://doi.org/10.1088/2631-7990/ada857
- Citations
- 41
- Primary Topic
- Advanced MEMS and NEMS Technologies
- Type
- article
- Field-Weighted Citation Impact
- 29.95
Funders
- National Natural Science Foundation of China
- Youth Innovation Promotion Association of the Chinese Academy of Sciences