Unraveling the influence of substrate surface and temperature on microstructural evolution of crystalline MoS<sub>2</sub> in atomic layer deposition

In this study, we examine the atomic layer deposition (ALD) growth behavior of crystalline MoS 2 films on various substrates, including SiO 2 , mica, and Al 2 O 3 , at deposition temperatures of ≥650 °C.

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Publication Details

Journal
Journal of Materials Chemistry C
Published
2025-01-01
DOI
https://doi.org/10.1039/d4tc04752d
Citations
4
Primary Topic
Metal and Thin Film Mechanics
Type
article
Field-Weighted Citation Impact
3.45
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article

Unraveling the influence of substrate surface and temperature on microstructural evolution of crystalline MoS2 in atomic layer deposition

Seong Keun Kim, Seung Ho Ryu
4 citations
Journal of Materials Chemistry C
Metal and Thin Film Mechanics
3.45
article

Unraveling the influence of substrate surface and temperature on microstructural evolution of crystalline MoS2 in atomic layer deposition

Seong Keun Kim, Seung Ho Ryu
article en
4 citations

Abstract

In this study, we examine the atomic layer deposition (ALD) growth behavior of crystalline MoS 2 films on various substrates, including SiO 2 , mica, and Al 2 O 3 , at deposition temperatures of ≥650 °C.

Journal of Materials Chemistry CVol. 13(8)
Korea University (KR), Korea Institute of Science and Technology (KR)
Life in Land
Openalex Percentile: Top 9%
Metal and Thin Film Mechanics
3.45
DOISourceOpenAlex
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