Measurement and Analysis of Surface Temperature Gradients on Magnetron Sputtered Thin Film Growth Studied Using NiCr/NiSi Thin Film Thermocouples (Small 1/2025)
Thin Film Growth In article number 2404829, Wanyu Ding, Zixi Wang, and co-workers established a three-layer NiCr/NiSi thin-film thermocouple temperature measurement system in TiO2 film growth processes, to measure the temperature gradient from TiO2 film growth surface to substrate. The temperature of substrate was about 132.05 °C, while the temperature difference between TiO2 film growth surface and substrate could reach to was about 144.71 °C.
Authors
- Wanyu Ding (ORCID: https://orcid.org/0000-0002-1186-204X)
- Chuanbing Zhang (ORCID: https://orcid.org/0000-0002-5228-3319)
- Gang Hao (ORCID: https://orcid.org/0000-0001-6125-9305)
- Zhihui Liu (ORCID: https://orcid.org/0000-0002-5812-1572)
- Yumeng Yang (ORCID: https://orcid.org/0009-0009-1911-0780)
- Yi Sun (ORCID: https://orcid.org/0000-0002-8019-6765)
- Tengda Guo (ORCID: https://orcid.org/0009-0002-6040-0906)
- Kai Shen (ORCID: https://orcid.org/0000-0002-3764-6775)
- Wang Bi (ORCID: https://orcid.org/0000-0001-9854-1697)
- Yongjun Cheng (ORCID: https://orcid.org/0009-0008-2886-2362)
- Jiankang Zhou (ORCID: https://orcid.org/0000-0003-4279-1982)
- Mengxuan Wu
- Kai Hu (ORCID: https://orcid.org/0000-0003-1436-9522)
- Baoli Cui
- Zixi Wang (ORCID: https://orcid.org/0000-0002-3914-148X)
Institutions
- Suzhou University of Science and Technology (CN)
- Dalian Jiaotong University (CN)
- Tsinghua University (CN)
Publication Details
- Journal
- Small
- Published
- 2025-01-01
- DOI
- https://doi.org/10.1002/smll.202570004
- Primary Topic
- Advanced Sensor Technologies Research
- Type
- article
- Field-Weighted Citation Impact
- 0.00