Optimization of the single crystal silicon nano-positioning stage in X-ray interferometer

To address the prevalent issues of excessive lateral angular displacement and low interference signal contrast in current X-ray interferometry nano-motion platforms, this paper presents an innovative hinge structure design. The design features a symmetrical flexible hinge, with its geometric parameters meticulously optimized through finite element analysis, including length, width, and thickness. By fine-tuning these parameters, the design aims to minimize the displacement of the motion platform along both the X and Y axes, thereby ensuring precise beam alignment and enhancing the contrast of the interference signal. Simulation results confirm that the optimized hinge structure effectively reduces the displacement of the motion platform along the X and Y axes, significantly lowering the lateral angular displacement and improving the interference signal contrast. This optimized design not only enhances the measurement accuracy and stability of X-ray interferometers but also provides strong technical support for expanding their application scope. As a high-precision nanoscale measurement tool, X-ray interferometers have extensive application prospects in fields such as surface morphology, film thickness, and lattice parameter measurement. The optimized hinge structure design offers a more reliable technical guarantee for the application of X-ray interferometers in these fields. Additionally, the high-precision motion control capabilities of the design also hold potential for application in other fields requiring high-precision motion control.