13 µm cutoff InAs/GaSb type-II superlattice nBn detectors with high quantum efficiency grown by MOCVD

In this work, we report the growth and fabrication optimization of a long wavelength InAs/GaSb type-II superlattice (T2SL) nBn detector grown by metal–organic chemical vapor deposition. A GaAs like interfacial scheme was employed to grow the T2SLs matched to InAs substrates. A larger bandgap InAs/GaSb T2SL was used as an electron barrier, removing the need for AlSb based materials within this detector. At 77 K and −0.1 V, the photodetector showed a dark current density of 2.2 × 10−2 A cm−2 and a 100% cutoff wavelength of 13 µm. The external quantum efficiency was found to be 54.4% at 9 µm. The peak detectivity was found to be 4.43 × 1010 cm Hz1/2/W at 9 µm, which is very comparable with similar deep etched detectors grown by molecular beam epitaxy.

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Publication Details

Journal
APL Photonics
Published
2025-01-01
DOI
https://doi.org/10.1063/5.0231448
Citations
5
Primary Topic
Advanced Semiconductor Detectors and Materials
Type
article
Field-Weighted Citation Impact
3.65

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article

13 µm cutoff InAs/GaSb type-II superlattice nBn detectors with high quantum efficiency grown by MOCVD

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5 citations
APL Photonics
Advanced Semiconductor Detectors and Materials
3.65
article

13 µm cutoff InAs/GaSb type-II superlattice nBn detectors with high quantum efficiency grown by MOCVD

J. I. Davies, Richard Brown, Richard Beanland, Adam P. Craig, Andrew Marshall, Ka Ming Wong, George Seager, Qiang Li, F.L. Castillo Alvarado, Chen Liu
article en
5 citations

Abstract

In this work, we report the growth and fabrication optimization of a long wavelength InAs/GaSb type-II superlattice (T2SL) nBn detector grown by metal–organic chemical vapor deposition. A GaAs like interfacial scheme was employed to grow the T2SLs matched to InAs substrates. A larger bandgap InAs/GaSb T2SL was used as an electron barrier, removing the need for AlSb based materials within this detector. At 77 K and −0.1 V, the photodetector showed a dark current density of 2.2 × 10−2 A cm−2 and a 100% cutoff wavelength of 13 µm. The external quantum efficiency was found to be 54.4% at 9 µm. The peak detectivity was found to be 4.43 × 1010 cm Hz1/2/W at 9 µm, which is very comparable with similar deep etched detectors grown by molecular beam epitaxy.

APL PhotonicsVol. 10(1)
IQE (United Kingdom) (GB), University of Warwick (GB), Lancaster University (GB), Cardiff University (GB)
Royal Society, Cardiff University, National Natural Science Foundation of China, Engineering and Physical Sciences Research Council, European Regional Development Fund
Openalex Percentile: Top 8%
Advanced Semiconductor Detectors and Materials
3.65
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