Adhesion-induced MoS2 layer transfer via in-situ TEM-nanoindentation: Effects of curvature and substrate mediated residual stress
Molybdenum disulfide (MoS 2 ) holds great potential in a wide range of applications, including electronics, photodetectors, light-emitting diodes (LEDs), and solar cells due to its unique two-dimensional (2D) structure. This structure enables innovative functionalities, particularly in flexible and wearable technologies. However, a significant knowledge gap remains regarding MoS 2 's interfacial adhesion, a critical aspect for advancing next-generation devices. To address this, we conducted a comprehensive study investigating the interaction forces originating from the bonding between atoms that govern the adhesion of ultra-thin 2D MoS 2 . Our pioneering in situ experiments, utilizing TEM-based nanoindentation, provided precise imaging and force monitoring of MoS 2 's interaction with a diamond. We employed four MoS 2 -coated AFM tips with varying radii and preparation methods, with films prepared on two Si wafers subjected to different oxidation protocols. Our findings, validated by Raman and X-ray photoelectron spectroscopy, reveal unique insights into MoS 2 's interfacial behavior. We observed a decreased structural order in MoS 2 on sharper tips, particularly those without pre-deposition oxidation. These results underscore the importance of residual stress between the MoS 2 film and substrate and the influence of curvature-induced residual stress in fostering less-ordered MoS 2 structures with heightened work of adhesion. Importantly, this is the first study to report the work of adhesion for MoS 2 -diamond contact. Our findings highlight the crucial role of covalent bonding at contact points in the material transfer processes involving 2D materials. This is a critical insight for developing precise and reliable methods for manipulating 2D materials, which could significantly advance our understanding and application of materials science, particularly in nanotechnology and device fabrication.
Authors
- Christopher Muratore (ORCID: https://orcid.org/0000-0002-5555-9261)
- M. Djafari Rouhani (ORCID: https://orcid.org/0000-0001-7261-4114)
- Takaaki Sato (ORCID: https://orcid.org/0000-0002-8826-0936)
- Robert W. Carpick (ORCID: https://orcid.org/0000-0002-3235-3156)
- Nicholas R. Glavin (ORCID: https://orcid.org/0000-0002-9447-7509)
- Yeau‐Ren Jeng (ORCID: https://orcid.org/0000-0001-6787-1538)
- J. David Schall (ORCID: https://orcid.org/0000-0002-3694-9934)
- Jhih H. Liang (ORCID: https://orcid.org/0000-0002-4611-5167)
Institutions
- University of the Sciences (US)
- University of Dayton (US)
- United States Air Force Research Laboratory (US)
- National Chung Cheng University (TW)
- Wright-Patterson Air Force Base (US)
- North Carolina Agricultural and Technical State University (US)
- University of Pennsylvania (US)
- National Cheng Kung University (TW)
Publication Details
- Journal
- Applied Surface Science Advances
- Published
- 2024-12-31
- DOI
- https://doi.org/10.1016/j.apsadv.2024.100686
- Citations
- 2
- Primary Topic
- Metal and Thin Film Mechanics
- Type
- article
- Field-Weighted Citation Impact
- 0.54