High-Efficiency 2 µm Band Interleaved-Etch Grating Coupler Optimized Using Edge Optimization Algorithm
Optimized grating coupler for 220 nm silicon SOI platform achieves 71.7% efficiency at 2 µm. Inverse design algorithm controls grating groove edges, optimizes diffraction mode field. Interlaced-etching structure enhances performance.
Authors
- Rui Zhong (ORCID: https://orcid.org/0000-0003-4605-5579)
- Ke Xu (ORCID: https://orcid.org/0000-0003-3062-8600)
- Jianing Wang (ORCID: https://orcid.org/0009-0003-5380-2779)
- Yihang Li (ORCID: https://orcid.org/0000-0002-7060-9036)
- Tao Wang
- Yifan Wu
Institutions
- Harbin Institute of Technology (CN)
Publication Details
- Published
- 2024-11-02
- DOI
- https://doi.org/10.1109/acp/ipoc63121.2024.10809736
- Citations
- 1
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.21
Funders
- National Natural Science Foundation of China