Equipment Protection for the Injector of Hefei Advanced Light Facility

The Hefei Advanced Light Facility (HALF) is a fourth-generation synchrotron radiation light source utilizing diffraction-limited storage ring technology. The injector, an initial component of HALF, generates and accelerates electron beams to 2.2 GeV using high-power microwave fields. To protect the injector from potential damage caused by the beam or microwaves, an Equipment Protection System (EPS) has been developed to ensure the safe operation of the injector. The EPS is structured into three layers: the device layer, the control layer, and the EPICS layer. This system is responsible for signal acquisition, interlock logic processing, and data monitoring. Experimental results demonstrate that the single-station response time and system-level response time are 17.1ms and 52.2ms, respectively, meeting the required protection standards.