Enhanced UV–Vis Rejection Ratio in Metal/BaTiO<sub>3</sub>/β‐Ga<sub>2</sub>O<sub>3</sub> Solar‐Blind Photodetectors

Abstract The fabrication and characterization of metal/BaTiO 3 /β‐Ga 2 O 3 solar‐blind photodetectors are reported. β‐Ga 2 O 3 is a promising material for solar‐blind photodetectors due to its large bandgap and the availability of low defect‐density melt‐grown substrates. In this work, structures are introduced that employ high‐permittivity dielectric/semiconductor heterojunctions to enhance the performance of a Schottky photodetector. It is shown that integrating the high‐k dielectric BaTiO 3 reduces the dark current by ≈10 4 , all but eliminates illumination induced Schottky barrier lowering, and increases the UV–vis rejection ratio by a factor greater than 9 × 10 3 compared to a Schottky photodetector. It is hypothesized that the high permittivity of the dielectric overcomes the influence of self‐trapped holes in Ga 2 O 3 to reduce the peak electric field at the dielectric/metal interface, thereby eliminating the effects of Schottky barrier lowering on illuminated β‐Ga 2 O 3 photodetectors. Additionally, it is hypothesized that the increase in the UV–vis rejection ratio is caused by the “dead layer” that forms at the BaTiO 3 /Pt interface.

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Publication Details

Journal
Advanced Electronic Materials
Published
2024-12-31
DOI
https://doi.org/10.1002/aelm.202400552
Citations
5
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
0.59

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Enhanced UV–Vis Rejection Ratio in Metal/BaTiO3/β‐Ga2O3 Solar‐Blind Photodetectors

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Advanced Electronic Materials
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article

Enhanced UV–Vis Rejection Ratio in Metal/BaTiO3/β‐Ga2O3 Solar‐Blind Photodetectors

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article en
5 citations

Abstract

Abstract The fabrication and characterization of metal/BaTiO 3 /β‐Ga 2 O 3 solar‐blind photodetectors are reported. β‐Ga 2 O 3 is a promising material for solar‐blind photodetectors due to its large bandgap and the availability of low defect‐density melt‐grown substrates. In this work, structures are introduced that employ high‐permittivity dielectric/semiconductor heterojunctions to enhance the performance of a Schottky photodetector. It is shown that integrating the high‐k dielectric BaTiO 3 reduces the dark current by ≈10 4 , all but eliminates illumination induced Schottky barrier lowering, and increases the UV–vis rejection ratio by a factor greater than 9 × 10 3 compared to a Schottky photodetector. It is hypothesized that the high permittivity of the dielectric overcomes the influence of self‐trapped holes in Ga 2 O 3 to reduce the peak electric field at the dielectric/metal interface, thereby eliminating the effects of Schottky barrier lowering on illuminated β‐Ga 2 O 3 photodetectors. Additionally, it is hypothesized that the increase in the UV–vis rejection ratio is caused by the “dead layer” that forms at the BaTiO 3 /Pt interface.

Advanced Electronic MaterialsVol. 11(1)
United States Air Force Research Laboratory (US), Radiation Monitoring Devices (United States) (US), The Ohio State University (US)
U.S. Department of Energy, Australian Government, National Nuclear Security Administration, Multidisciplinary University Research Initiative, Air Force Office of Scientific Research
Openalex Percentile: Top 38%
Ga2O3 and related materials
0.59
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