Image Processing Algorithm Assisted Optical Lithography Processing for the Fabrication of Photonic Chips
We demonstrate a measurement methodology for improving the photonic chip fabrication based on an image processing algorithm, where the chips with fabrication errors can be maintained within 0.22 µm via university-level optical photolithography.
Authors
- Quandong Huang (ORCID: https://orcid.org/0000-0002-6177-5550)
- Quankeng Huang (ORCID: https://orcid.org/0009-0001-0831-1327)
- Wenchao Jiang (ORCID: https://orcid.org/0000-0002-6300-1962)
Institutions
- Guangdong University of Technology (CN)
Publication Details
- Published
- 2024-08-16
- DOI
- https://doi.org/10.1109/icait62580.2024.10807978
- Primary Topic
- Photonic and Optical Devices
- Type
- article
- Field-Weighted Citation Impact
- 0.00