Simulation system for wet etching of quartz beam structures based on the hull method

The processing of integral beam structures in quartz sensor devices is mostly done by wet etching, and the anisotropy of quartz etching makes the results of the etching process unpredictable, so it is necessary to predict the results of the process by simulation before the etching process. In this paper, a quartz beam structure wet etching simulation system is developed based on the hull method. The system can realise the simulation of beam structure of quartz crystal plate with different cutting type. By inputting the width of etching mask, offset distance and thickness of crystal plate, the etching samples of beams with different widths and thicknesses under different etching time are simulated, which provides guidance for the processing of quartz integral beam structure.