High-performance 2D electronic devices enabled by strong and tough two-dimensional polymer with ultra-low dielectric constant
As the feature size of microelectronic circuits is scaling down to nanometer order, the increasing interconnect crosstalk, resistance-capacitance (RC) delay and power consumption can limit the chip performance and reliability. To address these challenges, new low-k dielectric (k < 2) materials need to be developed to replace current silicon dioxide (k = 3.9) or SiCOH, etc. However, existing low-k dielectric materials, such as organosilicate glass or polymeric dielectrics, suffer from poor thermal and mechanical properties. Two-dimensional polymers (2DPs) are considered promising low-k dielectric materials because of their good thermal and mechanical properties, high porosity and designability. Here, we report a chemical-vapor-deposition (CVD) method for growing fluoride rich 2DP-F films on arbitrary substrates. We show that the grown 2DP-F thin films exhibit ultra-low dielectric constant (in plane k = 1.85 and out-of-plane k = 1.82) and remarkable mechanical properties (Young's modulus > 15 GPa). We also demonstrated the improved performance of monolayer MoS<sub>2</sub> field-effect-transistors when utilizing 2DP-F thin films as dielectric substrates.
Authors
- Y. P. Wang
- Guanhui Gao (ORCID: https://orcid.org/0000-0002-4760-1378)
- Yuji Zhao (ORCID: https://orcid.org/0000-0001-9199-4159)
- Chen-yang Lin
- Jun Lou (ORCID: https://orcid.org/0000-0002-4351-9561)
- Yifan Zhu (ORCID: https://orcid.org/0000-0002-9816-5764)
- Xiaoyin Tian
- Rui Xu (ORCID: https://orcid.org/0000-0002-7072-1976)
- Yimo Han (ORCID: https://orcid.org/0000-0003-0563-4611)
- Haolei Zhou
- Zhong Yu (ORCID: https://orcid.org/0000-0001-8049-4108)
- Hanyu Zhu (ORCID: https://orcid.org/0000-0003-3376-5352)
- Qing Ai (ORCID: https://orcid.org/0000-0002-6086-5431)
- Yanjie Shao (ORCID: https://orcid.org/0000-0001-6472-5236)
- Xiang Zhang (ORCID: https://orcid.org/0000-0003-4004-5185)
- Shisong Luo (ORCID: https://orcid.org/0000-0001-5142-0935)
- Gustavo A. Alvarez (ORCID: https://orcid.org/0000-0001-7885-8275)
- Zhiting Tian (ORCID: https://orcid.org/0000-0002-5098-7507)
- Kongyang Yi (ORCID: https://orcid.org/0000-0002-1941-1032)
- Honghu Zhang (ORCID: https://orcid.org/0000-0003-1784-7825)
- Qiyi Fang (ORCID: https://orcid.org/0000-0001-8435-636X)
- Boyu Zhang (ORCID: https://orcid.org/0000-0001-6797-4828)
- Zheng Liu (ORCID: https://orcid.org/0000-0002-8825-7198)
- Yifeng Liu (ORCID: https://orcid.org/0009-0004-9454-1306)
- Tianshu Zhai
Institutions
- Nanyang Technological University (SG)
- Brookhaven National Laboratory (US)
- Cornell University (US)
- Massachusetts Institute of Technology (US)
- Rice University (US)
Publication Details
- Journal
- Nature Communications
- Published
- 2024-12-30
- DOI
- https://doi.org/10.1038/s41467-024-53935-6
- Citations
- 20
- Primary Topic
- Graphene research and applications
- Type
- article
- Field-Weighted Citation Impact
- 2.34
Funders
- National Science Foundation
- U.S. Department of Energy
- Semiconductor Research Corporation
- Rice University
- National Research Foundation
- Ministry of Education, India
- Defense Advanced Research Projects Agency
- Office of Science
- Office of Naval Research
- Division of Civil, Mechanical and Manufacturing Innovation
- Basic Energy Sciences
- Brookhaven National Laboratory
- Air Force Research Laboratory