Vertical GaN Schottky barrier diodes with micrometer pillar Schottky contacts
Abstract We present a novel design of gallium nitride (GaN) Schottky barrier diodes (SBDs) with a vertical micropillar structure. The micron-scale electrode design can effectively enhance the on-state current density and reduce the specific on-resistance ( R on,Sp ). In addition, it allows for a reduction in the turn-on voltage ( V on ) by minimizing the spacing between the electrodes. This phenomenon can be explained by the intensified electric field coupling between the electrodes, as confirmed from the technology computer aided design simulations. By controlling the distance between the micron pillars, the V on of the SBD varies from approximately 0.35 V to 0.46 V. These results showcase the potential of our SBD design with micropillar contacts in efficient high-power applications.
Authors
- Renqiang Zhu (ORCID: https://orcid.org/0000-0002-2456-2855)
- Shuangwu Huang
- Jie Zhang (ORCID: https://orcid.org/0000-0001-7821-4808)
- Bo Li (ORCID: https://orcid.org/0009-0006-2221-8643)
- Shijie He (ORCID: https://orcid.org/0000-0001-8313-0449)
- Hsien‐Chin Chiu (ORCID: https://orcid.org/0000-0003-1068-5798)
- Xinbo Xiong
- Shuai Li (ORCID: https://orcid.org/0000-0002-3043-5617)
- Zhengweng Ma
- Huakai Yang
- Xiaohua Li
Institutions
- University of Electronic Science and Technology of China (CN)
- Chang Gung University (TW)
- Shenzhen University (CN)
Publication Details
- Journal
- Journal of Physics D Applied Physics
- Published
- 2024-12-27
- DOI
- https://doi.org/10.1088/1361-6463/ada391
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Natural Science Foundation of China