Nanomembrane Etching and Release Process for the Realization of Hybrid InP/Si Photonic‐Crystal Surface‐Emitting Lasers Using Micro‐Transfer Printing

Herein, the fabrication of hybrid InP/Si 1.55 μm range photonic‐crystal surface‐emitting lasers (PCSELs) using micro‐transfer printing is reported on. This fabrication technology is expected to have important advantages in manufacturing, performance, and silicon integration, but it relies on a fine‐tuned process for selective etching, release, and subsequent printing of active InP membranes on top of a Si photonic‐crystal layer. Herein, the appropriate wet etching chemistry and processing methodology for preserved layer and interface integrity are discussed and the technology by optically pumped PCSELs is demonstrated, showing continuous‐wave operation at room temperature.